Sorption of the antibiotic ofloxacin to mesoporous and nonporous alumina and silica
Mesoporous and nonporous SiO 2 and Al 2O 3 adsorbents were reacted with the fluoroquinolone carboxylic acid ofloxacin over a range of pH values (2–10) and initial concentrations (0.03–8 mM) to investigate the effects of adsorbent type and intraparticle mesopores on adsorption/desorption. Maximum ofl...
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Veröffentlicht in: | Journal of colloid and interface science 2005-03, Vol.283 (1), p.160-170 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Mesoporous and nonporous SiO
2 and Al
2O
3 adsorbents were reacted with the fluoroquinolone carboxylic acid ofloxacin over a range of pH values (2–10) and initial concentrations (0.03–8 mM) to investigate the effects of adsorbent type and intraparticle mesopores on adsorption/desorption. Maximum ofloxacin adsorption to SiO
2 surfaces occurs slightly below the p
K
a
2
(pH 8.28) of the antibiotic and sorption diminishes rapidly at pH
>
p
K
a
2
. For Al
2O
3, maximum sorption is observed at pH values slightly higher than the adsorbent's point of zero net charge (p.z.n.c.) and less than midway between the p
K
a
values of ofloxacin. The effects of pH on adsorption and ATR–FTIR spectra suggest that the zwitterionic compound adsorbs to SiO
2 solids through the protonated N
4 in the piperazinyl group and, possibly, a cation bridge; whereas the antibiotic sorbs to Al
2O
3 solids through the ketone and carboxylate functional groups via a ligand exchange mechanism. Sorption edge and isotherm experiments show that ofloxacin exhibits a higher affinity for mesoporous SiO
2 and nonporous Al
2O
3, relative to their counterparts. It is hypothesized that decreased ofloxacin sorption to mesoporous Al
2O
3 occurs due to electrostatic repulsion within pore confines. In contrast, it appears that the environment within SiO
2 mesopores promotes sorption by inducing formation of ofloxacin–Ca complexes, thus increasing electrostatic attraction to SiO
2 surfaces. |
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ISSN: | 0021-9797 1095-7103 |
DOI: | 10.1016/j.jcis.2004.08.150 |