Analysis of Pseudopartial and Partial Wetting of Various Substrates by Lead

Analysis of Pseudopartial and Partial Wetting of Various Substrates by Lead

Lead drops exhibit partial wetting on some substrates and pseudopartial wetting on others. In pseudopartial wetting, a film is in equilibrium with a capillary body with a nonzero contact angle. Using a free energy formulation appropriate for the experiments, we show the conditions under which minimi...

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Veröffentlicht in:Langmuir 2004-03, Vol.20 (7), p.2726-2729
Hauptverfasser: Humfeld, Keith D, Garoff, Stephen, Wynblatt, Paul
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Garoff, Stephen
Wynblatt, Paul
description Lead drops exhibit partial wetting on some substrates and pseudopartial wetting on others. In pseudopartial wetting, a film is in equilibrium with a capillary body with a nonzero contact angle. Using a free energy formulation appropriate for the experiments, we show the conditions under which minimization of the system energy is accurately achieved by minimizing the energy of the film alone. Using a set of simple surface energy isotherms, we explain the various wetting behaviors of lead. We contrast isotherms for autophobing systems and the metallic systems considered here.
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title Analysis of Pseudopartial and Partial Wetting of Various Substrates by Lead
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