Roughness models for particle adhesion
The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distri...
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Veröffentlicht in: | Journal of colloid and interface science 2004-12, Vol.280 (2), p.289-298 |
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creator | Eichenlaub, Sean Gelb, Anne Beaudoin, Steve |
description | The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM. |
doi_str_mv | 10.1016/j.jcis.2004.08.017 |
format | Article |
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The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.</description><identifier>ISSN: 0021-9797</identifier><identifier>EISSN: 1095-7103</identifier><identifier>DOI: 10.1016/j.jcis.2004.08.017</identifier><identifier>PMID: 15533399</identifier><identifier>CODEN: JCISA5</identifier><language>eng</language><publisher>San Diego, CA: Elsevier Inc</publisher><subject>Chemistry ; Colloidal state and disperse state ; Exact sciences and technology ; Fourier transform ; General and physical chemistry ; Particle adhesion ; Physical and chemical studies. Granulometry. 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The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.</description><subject>Chemistry</subject><subject>Colloidal state and disperse state</subject><subject>Exact sciences and technology</subject><subject>Fourier transform</subject><subject>General and physical chemistry</subject><subject>Particle adhesion</subject><subject>Physical and chemical studies. Granulometry. 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Granulometry. Electrokinetic phenomena</topic><topic>Post-CMP cleaning</topic><topic>Surface roughness</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Eichenlaub, Sean</creatorcontrib><creatorcontrib>Gelb, Anne</creatorcontrib><creatorcontrib>Beaudoin, Steve</creatorcontrib><collection>Pascal-Francis</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Journal of colloid and interface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Eichenlaub, Sean</au><au>Gelb, Anne</au><au>Beaudoin, Steve</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Roughness models for particle adhesion</atitle><jtitle>Journal of colloid and interface science</jtitle><addtitle>J Colloid Interface Sci</addtitle><date>2004-12-15</date><risdate>2004</risdate><volume>280</volume><issue>2</issue><spage>289</spage><epage>298</epage><pages>289-298</pages><issn>0021-9797</issn><eissn>1095-7103</eissn><coden>JCISA5</coden><abstract>The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.</abstract><cop>San Diego, CA</cop><pub>Elsevier Inc</pub><pmid>15533399</pmid><doi>10.1016/j.jcis.2004.08.017</doi><tpages>10</tpages></addata></record> |
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source | ScienceDirect Journals (5 years ago - present) |
subjects | Chemistry Colloidal state and disperse state Exact sciences and technology Fourier transform General and physical chemistry Particle adhesion Physical and chemical studies. Granulometry. Electrokinetic phenomena Post-CMP cleaning Surface roughness |
title | Roughness models for particle adhesion |
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