Roughness models for particle adhesion

The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distri...

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Veröffentlicht in:Journal of colloid and interface science 2004-12, Vol.280 (2), p.289-298
Hauptverfasser: Eichenlaub, Sean, Gelb, Anne, Beaudoin, Steve
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Gelb, Anne
Beaudoin, Steve
description The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.
doi_str_mv 10.1016/j.jcis.2004.08.017
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source ScienceDirect Journals (5 years ago - present)
subjects Chemistry
Colloidal state and disperse state
Exact sciences and technology
Fourier transform
General and physical chemistry
Particle adhesion
Physical and chemical studies. Granulometry. Electrokinetic phenomena
Post-CMP cleaning
Surface roughness
title Roughness models for particle adhesion
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