Nanotribological properties of precision-controlled regular nanotexture on H-passivated Si surface by current-induced local anodic oxidation

Nanotribological properties of precision-controlled regular nanotexture on H-passivated Si surface by current-induced local anodic oxidation

Nano-sized textures resulted from localized electrochemical oxidation by using atomic force microscopy (AFM) were fabricated on H-passivated Si surface. In this paper, the fabrication and nanotribological properties of nanotexture by local anodic oxidation (LAO) on H-passivated Si surface are presen...

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Veröffentlicht in:Ultramicroscopy 2009-02, Vol.109 (3), p.247-252
Hauptverfasser: Mo, Yufei, Zhao, Wenjie, Huang, Deming, Zhao, Fei, Bai, Mingwu
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Sprache:eng
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Atomic force microscopy
Local anodic oxidation
Nanotexture
Nanotribology
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container_issue 3
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creator Mo, Yufei
Zhao, Wenjie
Huang, Deming
Zhao, Fei
Bai, Mingwu
description Nano-sized textures resulted from localized electrochemical oxidation by using atomic force microscopy (AFM) were fabricated on H-passivated Si surface. In this paper, the fabrication and nanotribological properties of nanotexture by local anodic oxidation (LAO) on H-passivated Si surface are presented. A special attention is paid to find the relation between the size of oxide nanotexture and operational parameters such as tip-sample pulsed bias voltage, pulsewidth, and relative humidity to fabricate oxide nanotexture. The nanotribological properties were investigated by a colloidal probe. The results indicate that the nanotextures exhibited low adhesion and greatly reduced friction force at nanometer scale.
doi_str_mv 10.1016/j.ultramic.2008.10.025
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subjects Atomic force microscopy
Local anodic oxidation
Nanotexture
Nanotribology
title Nanotribological properties of precision-controlled regular nanotexture on H-passivated Si surface by current-induced local anodic oxidation
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