Center wavelength shift dependence on substrate coefficient of thermal expansion for optical thin-film interference filters deposited by ion-beam sputtering
Single-layer films of Ta2O5 and multilayer thin-film filters of Ta2O5 and SiO2 were deposited by ion-beam-sputter deposition. Postdeposition annealing of the structures resulted in increased optical thickness of the films, resulting in an upward shift in the wavelength of the transmission-reflection...
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| Veröffentlicht in: | Applied Optics 2004-08, Vol.43 (23), p.4506-4511 |
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| Format: | Artikel |
| Sprache: | eng |
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