Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering

Nickel oxide (NiO) thin films were deposited onto glass substrates by the DC reactive magnetron sputtering technique. The as-deposited films were post-annealed in air at 450–500 °C for 5 h. The effect of annealing on the structural, microstructural, electrical and optical properties were studied by...

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Veröffentlicht in:	Physica. B, Condensed matter Condensed matter, 2008-11, Vol.403 (21), p.4104-4110
Hauptverfasser:	Subramanian, B., Mohamed Ibrahim, M., Senthilkumar, V., Murali, K.R., Vidhya, VS, Sanjeeviraja, C., Jayachandran, M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties DC magnetron sputtering Electrochromism Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Low-field transport and mobility piezoresistance Nickel oxide Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Other semiconductors Physics Semiconductor Thin films
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