In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings

With filtered pulsed arc discharge (FPAD) method it is possible to achieve very high adhesion of high quality diamond-like carbon (DLC). Here we explain this high adhesion with the oxide reduction and consequent carbide formation and ion mixing of the substrate when exposed to high temperature carbo...

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Veröffentlicht in:	Diamond and related materials 2008-12, Vol.17 (12), p.2071-2074
Hauptverfasser:	Tiainen, Veli-Matti, Soininen, Antti, Alakoski, Esa, Konttinen, Yrjö T.
Format:	Artikel
Sprache:	eng
Schlagworte:	Adhesion Arc discharges Carbon Coatings Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Diamond-like carbon Diamond-like carbon films Exact sciences and technology Filtered pulsed arc discharge Fullerenes and related materials diamonds, graphite Ion and electron beam-assisted deposition ion plating Materials science Mechanical and acoustical properties Methods of deposition of films and coatings film growth and epitaxy Oxides Physical properties of thin films, nonelectronic Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma deposition Plasma-based ion implantation and deposition Reduction Silicon substrates Specific materials Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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