Microstructure and electrical characteristics of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma

Radio frequency magnetron sputtered Ba0.65Sr0.35TiO3 (BST) thin films were etched in CF4/Ar/O2 plasma by magnetically enhanced reactive ion etching technique. The etching characteristics of BST films were characterized in terms of microstructure and electrical properties. Atomic force microscopy and...

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Veröffentlicht in:	Microelectronic engineering 2008-11, Vol.85 (11), p.2269-2275
Hauptverfasser:	ZUCI QUAN, SHENG XU, HAO HU, WEI LIU, HUIMING HUANG, SEBO, Bobby, GUOJIA FANG, MEIYA LI, XINGZHONG ZHAO
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Dielectric, amorphous and glass solid devices Electronic tubes, masers Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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