Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene

This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent,...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Surface and interface analysis 2009-01, Vol.41 (1), p.27-33
Hauptverfasser: Boscoletto, Angelo Boscolo, Gleria, Mario, Milani, Roberto, Meda, Laura, Bertani, Roberta
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 33
container_issue 1
container_start_page 27
container_title Surface and interface analysis
container_volume 41
creator Boscoletto, Angelo Boscolo
Gleria, Mario
Milani, Roberto
Meda, Laura
Bertani, Roberta
description This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene‐derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P:N:Cl stoichiometric ratios close to 1:1:1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature‐enhanced hydrolytical degradation mechanism. Copyright © 2008 John Wiley & Sons, Ltd.
doi_str_mv 10.1002/sia.2967
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_35662222</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>35662222</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3647-86f07527b9a0fdf2184adea2ef492ae48713d456717a87d091323ba833d7628e3</originalsourceid><addsrcrecordid>eNp1kMtuEzEUhi0EEqEg8QizAbGZ4MuML8uqhRBUcVEKLK0Tj60xOOPBnlGbPgDPjUOiChaczTnS_51v8SP0nOAlwZi-zh6WVHHxAC0IVrxWisiHaIFJQ2vaUPIYPcn5O8ZYMskX6NdmTg6Mrdw8mMnHAYK_g8NR3fipr8Y-5rGHOzvYKs_bPCWYbK5HSFP1db1eVhsfvIlDvYVsu2pX0uQh5H98Jfgj6-0tmD7EFM3ehPiX-yl65MqXfXbaZ-jL2zfXF-_qq4-r9cX5VW0Yb0QtucOipWKrALvOUSIb6CxQ6xpFwTZSENY1LRdEgBQdVoRRtgXJWCc4lZadoZdH75jiz9nmSe98NjYEGGycs2Yt57RMAV8dQZNizsk6PSa_g7TXBOtD0boUrQ9FF_TFyQnZQHAJBuPzPU-xaomSbeHqI3fjg93_16c36_OT98T7PNnbex7SD11S0epvH1a6eX_9qf18ealX7DcDmJ7u</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>35662222</pqid></control><display><type>article</type><title>Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene</title><source>Wiley Online Library All Journals</source><creator>Boscoletto, Angelo Boscolo ; Gleria, Mario ; Milani, Roberto ; Meda, Laura ; Bertani, Roberta</creator><creatorcontrib>Boscoletto, Angelo Boscolo ; Gleria, Mario ; Milani, Roberto ; Meda, Laura ; Bertani, Roberta</creatorcontrib><description>This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene‐derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P:N:Cl stoichiometric ratios close to 1:1:1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature‐enhanced hydrolytical degradation mechanism. Copyright © 2008 John Wiley &amp; Sons, Ltd.</description><identifier>ISSN: 0142-2421</identifier><identifier>EISSN: 1096-9918</identifier><identifier>DOI: 10.1002/sia.2967</identifier><identifier>CODEN: SIANDQ</identifier><language>eng</language><publisher>Chichester, UK: John Wiley &amp; Sons, Ltd</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Electron and ion emission by liquids and solids; impact phenomena ; Exact sciences and technology ; Materials science ; phosphazenes ; Photoemission and photoelectron spectra ; Physics ; silica ; soda-lime glass ; surface functionalization ; Surface treatments ; XPS</subject><ispartof>Surface and interface analysis, 2009-01, Vol.41 (1), p.27-33</ispartof><rights>Copyright © 2008 John Wiley &amp; Sons, Ltd.</rights><rights>2009 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3647-86f07527b9a0fdf2184adea2ef492ae48713d456717a87d091323ba833d7628e3</citedby><cites>FETCH-LOGICAL-c3647-86f07527b9a0fdf2184adea2ef492ae48713d456717a87d091323ba833d7628e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fsia.2967$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fsia.2967$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1416,4022,27921,27922,27923,45572,45573</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=20951985$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Boscoletto, Angelo Boscolo</creatorcontrib><creatorcontrib>Gleria, Mario</creatorcontrib><creatorcontrib>Milani, Roberto</creatorcontrib><creatorcontrib>Meda, Laura</creatorcontrib><creatorcontrib>Bertani, Roberta</creatorcontrib><title>Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene</title><title>Surface and interface analysis</title><addtitle>Surf. Interface Anal</addtitle><description>This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene‐derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P:N:Cl stoichiometric ratios close to 1:1:1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature‐enhanced hydrolytical degradation mechanism. Copyright © 2008 John Wiley &amp; Sons, Ltd.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electron and ion emission by liquids and solids; impact phenomena</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>phosphazenes</subject><subject>Photoemission and photoelectron spectra</subject><subject>Physics</subject><subject>silica</subject><subject>soda-lime glass</subject><subject>surface functionalization</subject><subject>Surface treatments</subject><subject>XPS</subject><issn>0142-2421</issn><issn>1096-9918</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp1kMtuEzEUhi0EEqEg8QizAbGZ4MuML8uqhRBUcVEKLK0Tj60xOOPBnlGbPgDPjUOiChaczTnS_51v8SP0nOAlwZi-zh6WVHHxAC0IVrxWisiHaIFJQ2vaUPIYPcn5O8ZYMskX6NdmTg6Mrdw8mMnHAYK_g8NR3fipr8Y-5rGHOzvYKs_bPCWYbK5HSFP1db1eVhsfvIlDvYVsu2pX0uQh5H98Jfgj6-0tmD7EFM3ehPiX-yl65MqXfXbaZ-jL2zfXF-_qq4-r9cX5VW0Yb0QtucOipWKrALvOUSIb6CxQ6xpFwTZSENY1LRdEgBQdVoRRtgXJWCc4lZadoZdH75jiz9nmSe98NjYEGGycs2Yt57RMAV8dQZNizsk6PSa_g7TXBOtD0boUrQ9FF_TFyQnZQHAJBuPzPU-xaomSbeHqI3fjg93_16c36_OT98T7PNnbex7SD11S0epvH1a6eX_9qf18ealX7DcDmJ7u</recordid><startdate>200901</startdate><enddate>200901</enddate><creator>Boscoletto, Angelo Boscolo</creator><creator>Gleria, Mario</creator><creator>Milani, Roberto</creator><creator>Meda, Laura</creator><creator>Bertani, Roberta</creator><general>John Wiley &amp; Sons, Ltd</general><general>Wiley</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>200901</creationdate><title>Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene</title><author>Boscoletto, Angelo Boscolo ; Gleria, Mario ; Milani, Roberto ; Meda, Laura ; Bertani, Roberta</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3647-86f07527b9a0fdf2184adea2ef492ae48713d456717a87d091323ba833d7628e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electron and ion emission by liquids and solids; impact phenomena</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>phosphazenes</topic><topic>Photoemission and photoelectron spectra</topic><topic>Physics</topic><topic>silica</topic><topic>soda-lime glass</topic><topic>surface functionalization</topic><topic>Surface treatments</topic><topic>XPS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Boscoletto, Angelo Boscolo</creatorcontrib><creatorcontrib>Gleria, Mario</creatorcontrib><creatorcontrib>Milani, Roberto</creatorcontrib><creatorcontrib>Meda, Laura</creatorcontrib><creatorcontrib>Bertani, Roberta</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Surface and interface analysis</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Boscoletto, Angelo Boscolo</au><au>Gleria, Mario</au><au>Milani, Roberto</au><au>Meda, Laura</au><au>Bertani, Roberta</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene</atitle><jtitle>Surface and interface analysis</jtitle><addtitle>Surf. Interface Anal</addtitle><date>2009-01</date><risdate>2009</risdate><volume>41</volume><issue>1</issue><spage>27</spage><epage>33</epage><pages>27-33</pages><issn>0142-2421</issn><eissn>1096-9918</eissn><coden>SIANDQ</coden><abstract>This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene‐derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P:N:Cl stoichiometric ratios close to 1:1:1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature‐enhanced hydrolytical degradation mechanism. Copyright © 2008 John Wiley &amp; Sons, Ltd.</abstract><cop>Chichester, UK</cop><pub>John Wiley &amp; Sons, Ltd</pub><doi>10.1002/sia.2967</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0142-2421
ispartof Surface and interface analysis, 2009-01, Vol.41 (1), p.27-33
issn 0142-2421
1096-9918
language eng
recordid cdi_proquest_miscellaneous_35662222
source Wiley Online Library All Journals
subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Electron and ion emission by liquids and solids
impact phenomena
Exact sciences and technology
Materials science
phosphazenes
Photoemission and photoelectron spectra
Physics
silica
soda-lime glass
surface functionalization
Surface treatments
XPS
title Surface functionalization with phosphazene substrates-part VII. Silicon-based materials functionalized with hexachlorocyclophosphazene
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T07%3A15%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Surface%20functionalization%20with%20phosphazene%20substrates-part%20VII.%20Silicon-based%20materials%20functionalized%20with%20hexachlorocyclophosphazene&rft.jtitle=Surface%20and%20interface%20analysis&rft.au=Boscoletto,%20Angelo%20Boscolo&rft.date=2009-01&rft.volume=41&rft.issue=1&rft.spage=27&rft.epage=33&rft.pages=27-33&rft.issn=0142-2421&rft.eissn=1096-9918&rft.coden=SIANDQ&rft_id=info:doi/10.1002/sia.2967&rft_dat=%3Cproquest_cross%3E35662222%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=35662222&rft_id=info:pmid/&rfr_iscdi=true