The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing
Magnetic-electrochemical compound polishing is applied in difficult-to-process materials little by little. The influence of the magnetic field to electrochemical process is very complicated. In the paper, using Coulomb laws and Lorentz force, the two kinds of math model of the movement of the charge...
Gespeichert in:
Veröffentlicht in: | Key engineering materials 2009-01, Vol.416, p.1-7 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 7 |
---|---|
container_issue | |
container_start_page | 1 |
container_title | Key engineering materials |
container_volume | 416 |
creator | Liu, Er Liang Niu, Yong Jiang Shi, Li Min Ma, Yong Feng |
description | Magnetic-electrochemical compound polishing is applied in difficult-to-process materials little by little. The influence of the magnetic field to electrochemical process is very complicated. In the paper, using Coulomb laws and Lorentz force, the two kinds of math model of the movement of the charged particles are established according to the different magnetic field whose direction is vertical or parallel to the electrical field. The velocity equations and loci equations of three typical particles are concluded in two kinds of magnetic field’s directions. To be compared and analyzed carefully, the influence of the magnetic field’s direction to polishing is concluded. This study can guide how to determine the magnetic field’s direction in magnetic-electrochemical compound polishing, and build the theoretical basis to study the mechanism of magnetic-electrochemical compound polishing. |
doi_str_mv | 10.4028/www.scientific.net/KEM.416.1 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_35053088</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>35053088</sourcerecordid><originalsourceid>FETCH-LOGICAL-c353t-19c1704588217a380da11314dd5bfa9d466aae265f7ff28db6cc1c12bc6a71dd3</originalsourceid><addsrcrecordid>eNqNkMtKAzEUhgdR8PoOWYi7GXMmM5kMiCC1XtCii7oOaS42Mk1qklLc-Rq-nk9ipKJbV-cc-P4fzlcUx4CrBtfsdL1eV1Fa7ZI1VlZOp9O78aRqgFawVewBpXXZd327nXcMpOxZTXeL_RhfMCbAoN0rhulco7ExWibkDUr5mojn3GQlurJ6UJ_vHxFd2pAB6x1KHj36wca5dc_IOiR-8XI8ZCZ4OdcLK8WARn6x9Cun_gKHxY4RQ9RHP_OgeLoaT0c35f3D9e3o4r6UpCWphF5Ch5uWsRo6QRhWAoBAo1Q7M6JXDaVC6Jq2pjOmZmpGpQQJ9UxS0YFS5KA42fQug39d6Zj4wkaph0E47VeRkxa3BDOWwbMNKIOPMWjDl8EuRHjjgPm3Yp4V8z_FPH_Ks2KeFXPI8fNNPAXhYtJyzl_8Krj82_8KvgD8EI9j</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>35053088</pqid></control><display><type>article</type><title>The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing</title><source>Scientific.net Journals</source><creator>Liu, Er Liang ; Niu, Yong Jiang ; Shi, Li Min ; Ma, Yong Feng</creator><creatorcontrib>Liu, Er Liang ; Niu, Yong Jiang ; Shi, Li Min ; Ma, Yong Feng</creatorcontrib><description>Magnetic-electrochemical compound polishing is applied in difficult-to-process materials little by little. The influence of the magnetic field to electrochemical process is very complicated. In the paper, using Coulomb laws and Lorentz force, the two kinds of math model of the movement of the charged particles are established according to the different magnetic field whose direction is vertical or parallel to the electrical field. The velocity equations and loci equations of three typical particles are concluded in two kinds of magnetic field’s directions. To be compared and analyzed carefully, the influence of the magnetic field’s direction to polishing is concluded. This study can guide how to determine the magnetic field’s direction in magnetic-electrochemical compound polishing, and build the theoretical basis to study the mechanism of magnetic-electrochemical compound polishing.</description><identifier>ISSN: 1013-9826</identifier><identifier>ISSN: 1662-9795</identifier><identifier>EISSN: 1662-9795</identifier><identifier>DOI: 10.4028/www.scientific.net/KEM.416.1</identifier><language>eng</language><publisher>Trans Tech Publications Ltd</publisher><ispartof>Key engineering materials, 2009-01, Vol.416, p.1-7</ispartof><rights>2009 Trans Tech Publications Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c353t-19c1704588217a380da11314dd5bfa9d466aae265f7ff28db6cc1c12bc6a71dd3</citedby><cites>FETCH-LOGICAL-c353t-19c1704588217a380da11314dd5bfa9d466aae265f7ff28db6cc1c12bc6a71dd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttps://www.scientific.net/Image/TitleCover/848?width=600</thumbnail><link.rule.ids>314,778,782,27911,27912</link.rule.ids></links><search><creatorcontrib>Liu, Er Liang</creatorcontrib><creatorcontrib>Niu, Yong Jiang</creatorcontrib><creatorcontrib>Shi, Li Min</creatorcontrib><creatorcontrib>Ma, Yong Feng</creatorcontrib><title>The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing</title><title>Key engineering materials</title><description>Magnetic-electrochemical compound polishing is applied in difficult-to-process materials little by little. The influence of the magnetic field to electrochemical process is very complicated. In the paper, using Coulomb laws and Lorentz force, the two kinds of math model of the movement of the charged particles are established according to the different magnetic field whose direction is vertical or parallel to the electrical field. The velocity equations and loci equations of three typical particles are concluded in two kinds of magnetic field’s directions. To be compared and analyzed carefully, the influence of the magnetic field’s direction to polishing is concluded. This study can guide how to determine the magnetic field’s direction in magnetic-electrochemical compound polishing, and build the theoretical basis to study the mechanism of magnetic-electrochemical compound polishing.</description><issn>1013-9826</issn><issn>1662-9795</issn><issn>1662-9795</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNqNkMtKAzEUhgdR8PoOWYi7GXMmM5kMiCC1XtCii7oOaS42Mk1qklLc-Rq-nk9ipKJbV-cc-P4fzlcUx4CrBtfsdL1eV1Fa7ZI1VlZOp9O78aRqgFawVewBpXXZd327nXcMpOxZTXeL_RhfMCbAoN0rhulco7ExWibkDUr5mojn3GQlurJ6UJ_vHxFd2pAB6x1KHj36wca5dc_IOiR-8XI8ZCZ4OdcLK8WARn6x9Cun_gKHxY4RQ9RHP_OgeLoaT0c35f3D9e3o4r6UpCWphF5Ch5uWsRo6QRhWAoBAo1Q7M6JXDaVC6Jq2pjOmZmpGpQQJ9UxS0YFS5KA42fQug39d6Zj4wkaph0E47VeRkxa3BDOWwbMNKIOPMWjDl8EuRHjjgPm3Yp4V8z_FPH_Ks2KeFXPI8fNNPAXhYtJyzl_8Krj82_8KvgD8EI9j</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>Liu, Er Liang</creator><creator>Niu, Yong Jiang</creator><creator>Shi, Li Min</creator><creator>Ma, Yong Feng</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20090101</creationdate><title>The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing</title><author>Liu, Er Liang ; Niu, Yong Jiang ; Shi, Li Min ; Ma, Yong Feng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-19c1704588217a380da11314dd5bfa9d466aae265f7ff28db6cc1c12bc6a71dd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Er Liang</creatorcontrib><creatorcontrib>Niu, Yong Jiang</creatorcontrib><creatorcontrib>Shi, Li Min</creatorcontrib><creatorcontrib>Ma, Yong Feng</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Key engineering materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Er Liang</au><au>Niu, Yong Jiang</au><au>Shi, Li Min</au><au>Ma, Yong Feng</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing</atitle><jtitle>Key engineering materials</jtitle><date>2009-01-01</date><risdate>2009</risdate><volume>416</volume><spage>1</spage><epage>7</epage><pages>1-7</pages><issn>1013-9826</issn><issn>1662-9795</issn><eissn>1662-9795</eissn><abstract>Magnetic-electrochemical compound polishing is applied in difficult-to-process materials little by little. The influence of the magnetic field to electrochemical process is very complicated. In the paper, using Coulomb laws and Lorentz force, the two kinds of math model of the movement of the charged particles are established according to the different magnetic field whose direction is vertical or parallel to the electrical field. The velocity equations and loci equations of three typical particles are concluded in two kinds of magnetic field’s directions. To be compared and analyzed carefully, the influence of the magnetic field’s direction to polishing is concluded. This study can guide how to determine the magnetic field’s direction in magnetic-electrochemical compound polishing, and build the theoretical basis to study the mechanism of magnetic-electrochemical compound polishing.</abstract><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/KEM.416.1</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1013-9826 |
ispartof | Key engineering materials, 2009-01, Vol.416, p.1-7 |
issn | 1013-9826 1662-9795 1662-9795 |
language | eng |
recordid | cdi_proquest_miscellaneous_35053088 |
source | Scientific.net Journals |
title | The Effect of the Magnetic Field’s Direction to Polishing in a Magnetic-Electrochemical Compound Polishing |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T03%3A59%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20Effect%20of%20the%20Magnetic%20Field%E2%80%99s%20Direction%20to%20Polishing%20in%20a%20Magnetic-Electrochemical%20Compound%20Polishing&rft.jtitle=Key%20engineering%20materials&rft.au=Liu,%20Er%20Liang&rft.date=2009-01-01&rft.volume=416&rft.spage=1&rft.epage=7&rft.pages=1-7&rft.issn=1013-9826&rft.eissn=1662-9795&rft_id=info:doi/10.4028/www.scientific.net/KEM.416.1&rft_dat=%3Cproquest_cross%3E35053088%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=35053088&rft_id=info:pmid/&rfr_iscdi=true |