A plasma enhanced chemical vapor deposition process to achieve branched carbon nanotubes

Vertically aligned carbon nanotubes (CNTs) have been grown on silicon substrates using nickel as the catalyst layer, acetylene as the carbon source, and hydrogen as the carrier gas. The quality of the CNTs has been examined using transmission and scanning electron microscopy and a tip-growth mechani...

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Veröffentlicht in:Carbon (New York) 2008-10, Vol.46 (12), p.1611-1614
Hauptverfasser: Abdi, Y., Mohajerzadeh, S., Koohshorkhi, J., Robertson, M.D., Andrei, C.M.
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container_end_page 1614
container_issue 12
container_start_page 1611
container_title Carbon (New York)
container_volume 46
creator Abdi, Y.
Mohajerzadeh, S.
Koohshorkhi, J.
Robertson, M.D.
Andrei, C.M.
description Vertically aligned carbon nanotubes (CNTs) have been grown on silicon substrates using nickel as the catalyst layer, acetylene as the carbon source, and hydrogen as the carrier gas. The quality of the CNTs has been examined using transmission and scanning electron microscopy and a tip-growth mechanism with an inner tube diameter of 5–8 nm was observed. The effect of plasma hydrogenation as a post-growth treatment was shown to lead to total or partial removal of the nickel seeds from the CNT tips. Using sequential hydrogenation and growth, it has been possible to achieve tree-like nanostructures.
doi_str_mv 10.1016/j.carbon.2008.06.059
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subjects Catalysis
Chemistry
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
General and physical chemistry
Materials science
Physics
Specific materials
Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry
title A plasma enhanced chemical vapor deposition process to achieve branched carbon nanotubes
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