Probing the diffusion of vacuum ultraviolet ( λ = 172 nm) induced oxidants by nanoparticles immobilization

Vacuum ultraviolet (VUV, λ = 172 nm) patterning of alkyl monolayer on silicon surface has been demonstrated with emphasis on the diffusion of VUV induced oxygen-derived active species, which are accountable for the pattern broadening. The VUV photons photo-dissociates the atmospheric oxygen and wate...

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Veröffentlicht in:Applied surface science 2009-09, Vol.255 (24), p.9817-9821
Hauptverfasser: Khatri, Om P., Hatanaka, Takeshi, Murase, Kuniaki, Sugimura, Hiroyuki
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Sprache:eng
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