Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrode

A VHF SiH4/H2 plasma was produced using a multi-rod electrode of 1200 mm×115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH4/H2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.