Small angle X-ray scattering measurements of spatial dependent linewidth in dense nanoline gratings

Small angle X-ray scattering (SAXS) was used to characterize the cross section of nanoline gratings fabricated with electron beam lithography (EBL) patterning followed by anisotropic wet etching into a single crystal silicon substrate. SAXS results at normal incidence clearly bear the signature of p...

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Veröffentlicht in:	Thin solid films 2009-08, Vol.517 (20), p.5844-5847
Hauptverfasser:	Wang, Chengqing, Fu, Wei-En, Li, Bin, Huang, Huai, Soles, Christopher, Lin, Eric K., Wu, Wen-li, Ho, Paul S., Cresswell, Michael W.
Format:	Artikel
Sprache:	eng
Schlagworte:	Anisotropic wet etching Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electron beam lithography Exact sciences and technology Line gratings Linewidth Materials science Methods of nanofabrication Nanoscale pattern formation Physics Silicon wafer Small angle X-ray scattering Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology X-ray diffraction and scattering X-ray scattering (including small-angle scattering)
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