An atomic-scale study of hydrogenated silicon cluster deposition on a crystalline silicon surface

Controlled deposition of clusters on solid surfaces has attracted lots of attention in recent years, because of its potential application to tailoring the desired electronic properties of the resulting surfaces. We have carried out an atomic-scale study to understand the deposition mechanism. The mo...

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Veröffentlicht in:	Thin solid films 2009-10, Vol.517 (23), p.6234-6238
Hauptverfasser:	Ning, Ning, Rinaldi, Steven M., Vach, Holger
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Deposition mechanism Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Hydrogenated silicon clusters Molecular dynamics simulations Physics Silicon surface Surface and interface electron states
Online-Zugang:	Volltext
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