Fabrication of 20 nm patterns for automatic measurement of electron beam size using BEAMETR technique

BEAMETR technique is developed for robust operator independent measurement of electron beam sizes in two coordinates. This method involves software and a specially designed pattern-sample. In this paper, we report the fabrication of this sample and the demonstration of beam size and shape measuremen...

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Veröffentlicht in:	Microelectronic engineering 2009-04, Vol.86 (4), p.524-528
Hauptverfasser:	Babin, S., Cabrini, S., Dhuey, S., Harteneck, B., Machin, M., Martynov, A., Peroz, C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electron Beam Lithography Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Metrology Microelectronic fabrication (materials and surfaces technology) Nanofabrication Physics Scanning probe microscopes, components and techniques Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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