Hybrid Plasma Generation Triggered by a Shunting Arc Discharge Using a Positively Biased Electrode

The recent trend in thin film deposition is to prepare ceramic films capable of enduring violent environments, such as corrosive pollutant gases with high temperatures. Different kinds of plasma species existing in the same space are advantageous in order to facilitate a reactive deposition between...

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Veröffentlicht in:	IEEE transactions on plasma science 2007-08, Vol.35 (4), p.1020-1026
Hauptverfasser:	Yukimura, K., Imai, T., Takaki, K., Ikehata, T.
Format:	Artikel
Sprache:	eng
Schlagworte:	Arc discharge Arc discharges Carbon Carbon dioxide Ceramics Deposition Durability Electric arcs Electric potential Electricity Electrodes emission spectrum Gas discharges hybrid plasma Hybrid power systems Paschen's law Plasma properties Plasma sources Plasma temperature Pollution shunting arc discharge Sputtering Thin films
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