Fieldstitching with Kirchhoff-boundaries as a model based description for line edge roughness (LER) in scatterometry
Optical scatterometry has established itself as one of the mainly applied methods for CD metrology besides CD-SEM during the recent years. However, grating imperfections such as line edge roughness have been largely neglected in scatterometry models so far. Since imperfections of the perfect periodi...
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| Veröffentlicht in: | Microelectronic engineering 2009-04, Vol.86 (4), p.1029-1032 |
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| container_title | Microelectronic engineering |
| container_volume | 86 |
| creator | Schuster, Thomas Rafler, Stephan Paz, Valeriano Ferreras Frenner, Karsten Osten, Wolfgang |
| description | Optical scatterometry has established itself as one of the mainly applied methods for CD metrology besides CD-SEM during the recent years. However, grating imperfections such as line edge roughness have been largely neglected in scatterometry models so far. Since imperfections of the perfect periodicity would yield large unit cells in a fully rigorous computation of the scatterograms an approximative method has to be used instead. To that end we propose a fieldstitching method which introduces virtual lateral Kirchhoff-boundaries. |
| doi_str_mv | 10.1016/j.mee.2008.11.019 |
| format | Article |
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| ispartof | Microelectronic engineering, 2009-04, Vol.86 (4), p.1029-1032 |
| issn | 0167-9317 1873-5568 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_34499545 |
| source | Elsevier ScienceDirect Journals |
| subjects | Exact sciences and technology Fieldstitching Instruments, apparatus, components and techniques common to several branches of physics and astronomy Kirchhoff approximation Line edge roughness OCD Optical scatterometry Physics Scanning probe microscopes, components and techniques |
| title | Fieldstitching with Kirchhoff-boundaries as a model based description for line edge roughness (LER) in scatterometry |
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