Robust kernel distance multivariate control chart using support vector principles
It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability...
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Veröffentlicht in: | International journal of production research 2008-09, Vol.46 (18), p.5075-5095 |
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description | It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability to those caused by 'special causes'. Most SPC and multivariate SPC (MSPC) methods are parametric in that they make assumptions about the distributional properties and autocorrelation structure of in-control process parameters, and, if satisfied, are effective in managing false alarms/-positives and false-negatives. However, when processes do not satisfy these assumptions, the effectiveness of SPC methods is compromised. Several non-parametric control charts based on sequential ranks of data depth measures have been proposed in the literature, but their development and implementation have been rather slow in industrial process control. Several non-parametric control charts based on machine learning principles have also been proposed in the literature to overcome some of these limitations. However, unlike conventional SPC methods, these non-parametric methods require event data from each out-of-control process state for effective model building. The paper presents a new non-parametric multivariate control chart based on kernel distance that overcomes these limitations by employing the notion of one-class classification based on support vector principles. The chart is non-parametric in that it makes no assumptions regarding the data probability density and only requires 'normal' or in-control data for effective representation of an in-control process. It does, however, make an explicit provision to incorporate any available data from out-of-control process states. Experimental evaluation on a variety of benchmarking datasets suggests that the proposed chart is effective for process monitoring. |
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B. ; Ellis, R. D.</creator><creatorcontrib>Camci, F. ; Chinnam, R. B. ; Ellis, R. D.</creatorcontrib><description>It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability to those caused by 'special causes'. Most SPC and multivariate SPC (MSPC) methods are parametric in that they make assumptions about the distributional properties and autocorrelation structure of in-control process parameters, and, if satisfied, are effective in managing false alarms/-positives and false-negatives. However, when processes do not satisfy these assumptions, the effectiveness of SPC methods is compromised. Several non-parametric control charts based on sequential ranks of data depth measures have been proposed in the literature, but their development and implementation have been rather slow in industrial process control. Several non-parametric control charts based on machine learning principles have also been proposed in the literature to overcome some of these limitations. However, unlike conventional SPC methods, these non-parametric methods require event data from each out-of-control process state for effective model building. The paper presents a new non-parametric multivariate control chart based on kernel distance that overcomes these limitations by employing the notion of one-class classification based on support vector principles. The chart is non-parametric in that it makes no assumptions regarding the data probability density and only requires 'normal' or in-control data for effective representation of an in-control process. It does, however, make an explicit provision to incorporate any available data from out-of-control process states. Experimental evaluation on a variety of benchmarking datasets suggests that the proposed chart is effective for process monitoring.</description><identifier>ISSN: 0020-7543</identifier><identifier>EISSN: 1366-588X</identifier><identifier>DOI: 10.1080/00207540500543265</identifier><identifier>CODEN: IJPRB8</identifier><language>eng</language><publisher>London: Taylor & Francis Group</publisher><subject>Applied sciences ; Artificial intelligence ; Benchmarks ; Computer science; control theory; systems ; Control chart ; Control charts ; Control theory. Systems ; Exact sciences and technology ; Industrial metrology. Testing ; Kernel distance ; Learning and adaptive systems ; Manufacturing ; Mechanical engineering. Machine design ; Modelling and identification ; Process control. 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B.</creatorcontrib><creatorcontrib>Ellis, R. D.</creatorcontrib><title>Robust kernel distance multivariate control chart using support vector principles</title><title>International journal of production research</title><description>It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability to those caused by 'special causes'. Most SPC and multivariate SPC (MSPC) methods are parametric in that they make assumptions about the distributional properties and autocorrelation structure of in-control process parameters, and, if satisfied, are effective in managing false alarms/-positives and false-negatives. However, when processes do not satisfy these assumptions, the effectiveness of SPC methods is compromised. Several non-parametric control charts based on sequential ranks of data depth measures have been proposed in the literature, but their development and implementation have been rather slow in industrial process control. Several non-parametric control charts based on machine learning principles have also been proposed in the literature to overcome some of these limitations. However, unlike conventional SPC methods, these non-parametric methods require event data from each out-of-control process state for effective model building. The paper presents a new non-parametric multivariate control chart based on kernel distance that overcomes these limitations by employing the notion of one-class classification based on support vector principles. The chart is non-parametric in that it makes no assumptions regarding the data probability density and only requires 'normal' or in-control data for effective representation of an in-control process. It does, however, make an explicit provision to incorporate any available data from out-of-control process states. Experimental evaluation on a variety of benchmarking datasets suggests that the proposed chart is effective for process monitoring.</description><subject>Applied sciences</subject><subject>Artificial intelligence</subject><subject>Benchmarks</subject><subject>Computer science; control theory; systems</subject><subject>Control chart</subject><subject>Control charts</subject><subject>Control theory. Systems</subject><subject>Exact sciences and technology</subject><subject>Industrial metrology. Testing</subject><subject>Kernel distance</subject><subject>Learning and adaptive systems</subject><subject>Manufacturing</subject><subject>Mechanical engineering. Machine design</subject><subject>Modelling and identification</subject><subject>Process control. Computer integrated manufacturing</subject><subject>Process controls</subject><subject>Statistical process control</subject><subject>Studies</subject><subject>Support vector machines</subject><issn>0020-7543</issn><issn>1366-588X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNqFkE1rFTEUhoMoeK3-AHeDUHejJ5-TgW6k-AUFUSx0F87kJm1q7mRMMtX-e1Nu7aJFzCaE8zwvJy8hLym8oaDhLQCDQQqQAFJwpuQjsqFcqV5qffaYbG7mfQP4U_KslEtoR2qxIV-_pWkttfvh8uxitw2l4mxdt1tjDVeYA1bX2TTXnGJnLzDXbi1hPu_Kuiypva6crSl3Sw6zDUt05Tl54jEW9-L2PiCnH95_P_7Un3z5-Pn43UlvxTDU3uGAbAQ_OKWFUIAjnbyYGGd65JJ7vnVOMCnbALwVqKatm8BPOCKzTI38gLze5y45_VxdqWYXinUx4uzSWgwXQnNGaQNf3QMv05rntpthVCs5jko3iO4hm1Mp2XnTfrTDfG0omJuGzYOGm3N4G4zFYvS5NRfKnchAwSAUa9yw58LsU97hr5Tj1lS8jin_lR6km_q7NvPovyb_94J_AKl5oQA</recordid><startdate>20080901</startdate><enddate>20080901</enddate><creator>Camci, F.</creator><creator>Chinnam, R. B.</creator><creator>Ellis, R. 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D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c477t-ea7a290f7e684460a91bf4b23289353f3dee42550a90fc4a6bdeb0fba9a2c2693</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Applied sciences</topic><topic>Artificial intelligence</topic><topic>Benchmarks</topic><topic>Computer science; control theory; systems</topic><topic>Control chart</topic><topic>Control charts</topic><topic>Control theory. Systems</topic><topic>Exact sciences and technology</topic><topic>Industrial metrology. Testing</topic><topic>Kernel distance</topic><topic>Learning and adaptive systems</topic><topic>Manufacturing</topic><topic>Mechanical engineering. Machine design</topic><topic>Modelling and identification</topic><topic>Process control. Computer integrated manufacturing</topic><topic>Process controls</topic><topic>Statistical process control</topic><topic>Studies</topic><topic>Support vector machines</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Camci, F.</creatorcontrib><creatorcontrib>Chinnam, R. B.</creatorcontrib><creatorcontrib>Ellis, R. 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D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Robust kernel distance multivariate control chart using support vector principles</atitle><jtitle>International journal of production research</jtitle><date>2008-09-01</date><risdate>2008</risdate><volume>46</volume><issue>18</issue><spage>5075</spage><epage>5095</epage><pages>5075-5095</pages><issn>0020-7543</issn><eissn>1366-588X</eissn><coden>IJPRB8</coden><abstract>It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability to those caused by 'special causes'. Most SPC and multivariate SPC (MSPC) methods are parametric in that they make assumptions about the distributional properties and autocorrelation structure of in-control process parameters, and, if satisfied, are effective in managing false alarms/-positives and false-negatives. However, when processes do not satisfy these assumptions, the effectiveness of SPC methods is compromised. Several non-parametric control charts based on sequential ranks of data depth measures have been proposed in the literature, but their development and implementation have been rather slow in industrial process control. Several non-parametric control charts based on machine learning principles have also been proposed in the literature to overcome some of these limitations. However, unlike conventional SPC methods, these non-parametric methods require event data from each out-of-control process state for effective model building. The paper presents a new non-parametric multivariate control chart based on kernel distance that overcomes these limitations by employing the notion of one-class classification based on support vector principles. The chart is non-parametric in that it makes no assumptions regarding the data probability density and only requires 'normal' or in-control data for effective representation of an in-control process. It does, however, make an explicit provision to incorporate any available data from out-of-control process states. Experimental evaluation on a variety of benchmarking datasets suggests that the proposed chart is effective for process monitoring.</abstract><cop>London</cop><cop>Washington, DC</cop><pub>Taylor & Francis Group</pub><doi>10.1080/00207540500543265</doi><tpages>21</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Applied sciences Artificial intelligence Benchmarks Computer science control theory systems Control chart Control charts Control theory. Systems Exact sciences and technology Industrial metrology. Testing Kernel distance Learning and adaptive systems Manufacturing Mechanical engineering. Machine design Modelling and identification Process control. Computer integrated manufacturing Process controls Statistical process control Studies Support vector machines |
title | Robust kernel distance multivariate control chart using support vector principles |
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