A complementary geometric model for the growth of GaN nanocolumns prepared by plasma-assisted molecular beam epitaxy

In this article, we propose a new complementary geometrical growth mechanism, which may partially explain some of the apparent anomalies in our understanding of the growth of GaN nanocolumns by plasma-assisted molecular beam epitaxy (PA-MBE). This geometrical addition to any complete model for nanocolumn growth is based on the fact that most samples are grown using substrate rotation and it predicts an enhanced growth rate in the plane normal to the surface, i.e. vertically compared with the lateral growth rate of the columns. It also suggests a mechanism for the enhanced diffusion of gallium on the sidewalls of the columns even under strongly nitrogen-rich conditions. Finally, geometrical considerations also predict the growth of non-(0 0 0 1) oriented samples from the same mechanism. Some experimental evidence supporting this complementary geometrical model is presented.