A Simplified Method to Produce a Functional Test Stamp for Nanoimprint Lithography (NIL)
Nanoimprint lithography (NIL) is a novel technique that allows fabrication of submicron features into substrates using a modified embossing method into a polymer resist. In most cases, a stamp is produced by direct e-beam writing into a resist and then the pattern is etched into the substrate. Other...
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| Veröffentlicht in: | IEEE sensors journal 2009-03, Vol.9 (3), p.233-234 |
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| creator | Yaghmaie, F. Nielsen, W. Han, H. Bhushan, A. Davis, C.E. |
| description | Nanoimprint lithography (NIL) is a novel technique that allows fabrication of submicron features into substrates using a modified embossing method into a polymer resist. In most cases, a stamp is produced by direct e-beam writing into a resist and then the pattern is etched into the substrate. Other stamp fabrication methods exist but, in general, they are expensive to produce. When performing NIL, damage may occur to the stamp unless the process steps are optimized. In this letter, we illustrate a simple and inexpensive method to produce a test stamp to use for NIL process optimization. This may have wide applications in both industrial and academic settings. |
| doi_str_mv | 10.1109/JSEN.2008.2011963 |
| format | Article |
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This may have wide applications in both industrial and academic settings.</description><subject>Embossing</subject><subject>Etching</subject><subject>Fabrication</subject><subject>Gratings</subject><subject>Lithography</subject><subject>Nanocomposites</subject><subject>Nanofabrication</subject><subject>nanoimprint lithography (NIL)</subject><subject>Nanolithography</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Nanotechnology</subject><subject>Optical sensors</subject><subject>Optimization</subject><subject>Polymers</subject><subject>Resists</subject><subject>stamp fabrication</subject><subject>Testing</subject><issn>1530-437X</issn><issn>1558-1748</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqFkT9PwzAQxSMEElD4AIjFYuDPkOLzObE9ItRCUSlILVK3yCQ2DUrj4iRDvz2uWjEwwHJ3w-89nd6LojOgfQCqbp-mg0mfUSrDAFAp7kVHkCQyBsHl_uZGGnMU88PouGk-KQUlEnEUze_ItFyuqtKWpiDPpl24grSOvHpXdLkhmgy7Om9LV-uKzEzTkmmrlytinScTXbug9WXdknEZlB9erxZrcj0ZjW9OogOrq8ac7nYvehsOZveP8fjlYXR_N45zlKKNFeQsFUYLTKxARKvBCI3WpqawBcvfOWr1zrRkkmtusQifc5sIg0ymhcyxF11tfVfefXXhwWxZNrmpKl0b1zWZophyBRT-JaVIKOPAMJCXf5LIuUDKkgBe_AI_XedDVMEtBSqZEipAsIVy75rGG5uFyJbarzOg2aa8bFNetikv25UXNOdbTWmM-eG5kKBQ4je5mpPa</recordid><startdate>20090301</startdate><enddate>20090301</enddate><creator>Yaghmaie, F.</creator><creator>Nielsen, W.</creator><creator>Han, H.</creator><creator>Bhushan, A.</creator><creator>Davis, C.E.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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In most cases, a stamp is produced by direct e-beam writing into a resist and then the pattern is etched into the substrate. Other stamp fabrication methods exist but, in general, they are expensive to produce. When performing NIL, damage may occur to the stamp unless the process steps are optimized. In this letter, we illustrate a simple and inexpensive method to produce a test stamp to use for NIL process optimization. This may have wide applications in both industrial and academic settings.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/JSEN.2008.2011963</doi><tpages>2</tpages></addata></record> |
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| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Embossing Etching Fabrication Gratings Lithography Nanocomposites Nanofabrication nanoimprint lithography (NIL) Nanolithography Nanomaterials Nanostructure Nanotechnology Optical sensors Optimization Polymers Resists stamp fabrication Testing |
| title | A Simplified Method to Produce a Functional Test Stamp for Nanoimprint Lithography (NIL) |
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