Acid-diffusion behaviour in organic thin films and its effect on patterning

Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall qualit...

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Veröffentlicht in:	Journal of materials chemistry 2009-01, Vol.19 (19), p.2986-2992
Hauptverfasser:	LEE, Jin-Kyun, CHATZICHRISTIDI, Margarita, WONG, Wallace W. H, MALLIARAS, George G, OBER, Christopher K, ZAKHIDOV, Alexander A, HA SOO HWANG, SCHWARTZ, Evan L, JING SHA, TAYLOR, Priscilla G, HON HANG FONG, DEFRANCO, John A, MUROTANI, Eisuke
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Diffusion in solids Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transport properties of condensed matter (nonelectronic)
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