Diamond nanoseeding on silicon : Stability under H2 MPCVD exposures and early stages of growth

Detonation nanodiamond dispersed on silicon surfaces underwent different H2 MPCVD exposures. The induced changes at the surface have been characterized in situ by XPS and XEELS. Then, a short CH4/H2 growth step was applied. This sequential study revealed an excellent stability of detonation nanodiam...

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Veröffentlicht in:	Diamond and related materials 2008-07, Vol.17 (7-10), p.1143-1149
Hauptverfasser:	ARNAULT, J. C, SAADA, S, NESLADEK, M, WILLIAMS, O. A, HAENEN, K, BERGONZO, P, OSAWA, E
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Fullerenes and related materials diamonds, graphite Materials science Methods of deposition of films and coatings film growth and epitaxy Methods of nanofabrication Nanocrystalline materials Nanoscale materials and structures: fabrication and characterization Physics Specific materials Theory and models of film growth
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