Post-deposition growth kinetics of Ge on Ge(0 0 1)

We study the nucleation and growth kinetics on the Ge(0 0 1) surface at elevated temperatures using in situ surface X-ray diffraction. The time evolution of characteristic length scales on the surface is analyzed through the widths of the different components of the integer-order (morphology sensiti...

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Veröffentlicht in:	Journal of crystal growth 2008-07, Vol.310 (15), p.3416-3421
Hauptverfasser:	Tinkham, B.P., Jenichen, B., Kaganer, V.M., Shayduk, R., Braun, W., Ploog, K.H.
Format:	Artikel
Sprache:	eng
Schlagworte:	A1. High-resolution X-ray diffraction A1. Surfaces A3. Molecular beam epitaxy B2. Semiconducting germanium Condensed matter: structure, mechanical and thermal properties Equations of state, phase equilibria, and phase transitions Exact sciences and technology General studies of phase transitions Nucleation Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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