Crystallization of amorphous silicon thin films using nanoenergetic intermolecular materials with buffer layers

Optimization of the crystallization of amorphous silicon (a-Si) using a mixture of nanoenergetic materials of iron oxide/aluminum (Fe 2O 3/Al) was studied. To achieve high-quality polycrystalline Si (poly-Si) thin films, silicon oxide (SiO 2) and silver (Ag) layer were deposited on the a-Si as buffe...

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Veröffentlicht in:Journal of crystal growth 2009-02, Vol.311 (4), p.1025-1031
Hauptverfasser: Lee, Choong Hee, Jeong, Tae Hoon, Kim, Do Kyung, Jeong, Woong Hee, Kang, Myung-Koo, Hwang, Tae Hyung, Kim, Hyun Jae
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Sprache:eng
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