Preparation of cobalt oxide thin films and its use in supercapacitor application

Present work explored a room temperature, simple and low cost chemical route for the cobalt oxide film onto copper substrate from cobalt chloride (CoCl 2·6H 2O) precursor and characterization for its structural and electrochemical properties for supercapacitor application. The morphology and crystal...

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Veröffentlicht in:Applied surface science 2008-06, Vol.254 (17), p.5540-5544
Hauptverfasser: Kandalkar, S.G., Gunjakar, J.L., Lokhande, C.D.
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container_end_page 5544
container_issue 17
container_start_page 5540
container_title Applied surface science
container_volume 254
creator Kandalkar, S.G.
Gunjakar, J.L.
Lokhande, C.D.
description Present work explored a room temperature, simple and low cost chemical route for the cobalt oxide film onto copper substrate from cobalt chloride (CoCl 2·6H 2O) precursor and characterization for its structural and electrochemical properties for supercapacitor application. The morphology and crystal structure of the film were investigated by scanning electron microscopy and X-ray diffraction techniques, respectively. The electrochemical supercapacitive properties of cobalt oxide film were evaluated using cyclic voltammetry and galvanostatic charge–discharge methods. The film showed maximum specific capacitance of (165 F/g) in 1.0 M aqueous KOH electrolyte at scan rate 10 mV/s.
doi_str_mv 10.1016/j.apsusc.2008.02.163
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subjects Charge–discharge
Chemistry
Cobalt oxide
Condensed matter: structure, mechanical and thermal properties
Cyclic voltammetry
Electrochemistry
Electrodes: preparations and properties
Exact sciences and technology
General and physical chemistry
Physics
Single-crystal and powder diffraction
Structure and morphology
thickness
Structure of solids and liquids
crystallography
Supercapacitor
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
X-ray diffraction and scattering
title Preparation of cobalt oxide thin films and its use in supercapacitor application
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