Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process

Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process

A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA l...

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Veröffentlicht in:Microelectronic engineering 2008-05, Vol.85 (5-6), p.814-817
Hauptverfasser: Yang, Haifang, Jin, Aizi, Luo, Qiang, Li, Junjie, Gu, Changzhi, Cui, Zheng
Format: Artikel
Sprache:eng
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Applied sciences
Electron beam lithography
Electronics
Exact sciences and technology
HSQ/PMMA bilayer resist
Microelectronic fabrication (materials and surfaces technology)
Negative tone lift-off
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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container_end_page 817
container_issue 5-6
container_start_page 814
container_title Microelectronic engineering
container_volume 85
creator Yang, Haifang
Jin, Aizi
Luo, Qiang
Li, Junjie
Gu, Changzhi
Cui, Zheng
description A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA layer using oxygen reactive ion etching. Electron beam exposure of HSQ on top of PMMA layer has been characterised, showing the PMMA underlayer has no effect on the exposure of HSQ. Optimum conditions for reactive ion etching of PMMA underlayer have been established. The undercut length in the PMMA layer is found near linearly dependence on etching time. Well defined undercut profile has been achieved in the HSQ/PMMA bilayer resist system, and good negative tone metal lift-off structures have been successfully produced.
doi_str_mv 10.1016/j.mee.2008.01.006
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subjects Applied sciences
Electron beam lithography
Electronics
Exact sciences and technology
HSQ/PMMA bilayer resist
Microelectronic fabrication (materials and surfaces technology)
Negative tone lift-off
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process
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