Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method

Electron beam direct write (EBDW) provides high resolution for device and technology development. A new variable shaped beam system with improved electron optics was introduced, which features the capability for the 32nm node. Because of the limited resolution of commercially available chemically am...

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Veröffentlicht in:	Microelectronic engineering 2008-05, Vol.85 (5-6), p.778-781
Hauptverfasser:	Keil, Katja, Choi, Kang-Hoon, Hohle, Christoph, Kretz, Johannes, Lutz, Tarek, Bettin, Lutz, Boettcher, Monika, Hahmann, Peter, Kliem, Karl-Heinz, Schnabel, Bernd, Irmscher, Mathias, Sailer, Holger
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Bossung plot E-Beam lithography Electronics Exact sciences and technology High resolution Isofocal dose Microelectronic fabrication (materials and surfaces technology) Process window Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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