Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture
A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefo...
Gespeichert in:
| Veröffentlicht in: | Microelectronic engineering 2008-05, Vol.85 (5-6), p.925-928 |
|---|---|
| Hauptverfasser: | , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 928 |
|---|---|
| container_issue | 5-6 |
| container_start_page | 925 |
| container_title | Microelectronic engineering |
| container_volume | 85 |
| creator | Sung, Jun-Ho Yang, Jeong-Su Kim, Bo-Soon Choi, Chul-Hyun Lee, Min-Woo Lee, Seung-Gol Park, Se-Geun Lee, El-Hang O, Beom-Hoan |
| description | A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings. |
| doi_str_mv | 10.1016/j.mee.2008.01.094 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_33553889</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0167931708000816</els_id><sourcerecordid>33553889</sourcerecordid><originalsourceid>FETCH-LOGICAL-c358t-c7245623f3a9c0352f2ad180a3f9158deedce02ca9ec84418bbc6babb19fa3b03</originalsourceid><addsrcrecordid>eNp9UE1rGzEQFSGFOml_QG-6pLfd6GNla-mpmKYNBHJJzmJWO7Jl5JUraR387yvj0GNOw7x5783MI-QbZy1nfHm_a_eIrWBMt4y3rO-uyILrlWyUWuprsqicVdNLvvpMbnLesdp3TC_IcR2nkmKg0dFxLieaoPhI_UTf4Iib2Y9IN2ds2mQ651oo0AkhNc5jGOk2hljnh623NPiyvTQnmk-54J6-VagKjpA8DAEpHDCVOeEX8slByPj1vd6S14dfL-s_zdPz78f1z6fGSqVLY1eiU0shnYTeMqmEEzByzUC6nis9Io4WmbDQo9Vdx_Uw2OUAw8B7B3Jg8pZ8v_geUvw7Yy5m77PFEGDCOGcjpVJS674S-YVoU8w5oTOH5PeQToYzc07Y7ExN2JwTNoybmnDV3L2bQ7YQXILJ-vxfKFjXC6HOR_y48LB-evSYTLYeJ4ujT2iLGaP_YMs_CIiT1w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>33553889</pqid></control><display><type>article</type><title>Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture</title><source>Elsevier ScienceDirect Journals</source><creator>Sung, Jun-Ho ; Yang, Jeong-Su ; Kim, Bo-Soon ; Choi, Chul-Hyun ; Lee, Min-Woo ; Lee, Seung-Gol ; Park, Se-Geun ; Lee, El-Hang ; O, Beom-Hoan</creator><creatorcontrib>Sung, Jun-Ho ; Yang, Jeong-Su ; Kim, Bo-Soon ; Choi, Chul-Hyun ; Lee, Min-Woo ; Lee, Seung-Gol ; Park, Se-Geun ; Lee, El-Hang ; O, Beom-Hoan</creatorcontrib><description>A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2008.01.094</identifier><identifier>CODEN: MIENEF</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Circuit properties ; Electric, optical and optoelectronic circuits ; Electronics ; Exact sciences and technology ; Integrated optics. Optical fibers and wave guides ; Microelectronic fabrication (materials and surfaces technology) ; Near-field holographic lithography ; Non-uniform duty ratio ; Optical and optoelectronic circuits ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Waveguide grating</subject><ispartof>Microelectronic engineering, 2008-05, Vol.85 (5-6), p.925-928</ispartof><rights>2008 Elsevier B.V.</rights><rights>2008 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c358t-c7245623f3a9c0352f2ad180a3f9158deedce02ca9ec84418bbc6babb19fa3b03</citedby><cites>FETCH-LOGICAL-c358t-c7245623f3a9c0352f2ad180a3f9158deedce02ca9ec84418bbc6babb19fa3b03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0167931708000816$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,23909,23910,25118,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=20492250$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Sung, Jun-Ho</creatorcontrib><creatorcontrib>Yang, Jeong-Su</creatorcontrib><creatorcontrib>Kim, Bo-Soon</creatorcontrib><creatorcontrib>Choi, Chul-Hyun</creatorcontrib><creatorcontrib>Lee, Min-Woo</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><creatorcontrib>Lee, El-Hang</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><title>Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture</title><title>Microelectronic engineering</title><description>A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings.</description><subject>Applied sciences</subject><subject>Circuit properties</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Integrated optics. Optical fibers and wave guides</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Near-field holographic lithography</subject><subject>Non-uniform duty ratio</subject><subject>Optical and optoelectronic circuits</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Waveguide grating</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp9UE1rGzEQFSGFOml_QG-6pLfd6GNla-mpmKYNBHJJzmJWO7Jl5JUraR387yvj0GNOw7x5783MI-QbZy1nfHm_a_eIrWBMt4y3rO-uyILrlWyUWuprsqicVdNLvvpMbnLesdp3TC_IcR2nkmKg0dFxLieaoPhI_UTf4Iib2Y9IN2ds2mQ651oo0AkhNc5jGOk2hljnh623NPiyvTQnmk-54J6-VagKjpA8DAEpHDCVOeEX8slByPj1vd6S14dfL-s_zdPz78f1z6fGSqVLY1eiU0shnYTeMqmEEzByzUC6nis9Io4WmbDQo9Vdx_Uw2OUAw8B7B3Jg8pZ8v_geUvw7Yy5m77PFEGDCOGcjpVJS674S-YVoU8w5oTOH5PeQToYzc07Y7ExN2JwTNoybmnDV3L2bQ7YQXILJ-vxfKFjXC6HOR_y48LB-evSYTLYeJ4ujT2iLGaP_YMs_CIiT1w</recordid><startdate>20080501</startdate><enddate>20080501</enddate><creator>Sung, Jun-Ho</creator><creator>Yang, Jeong-Su</creator><creator>Kim, Bo-Soon</creator><creator>Choi, Chul-Hyun</creator><creator>Lee, Min-Woo</creator><creator>Lee, Seung-Gol</creator><creator>Park, Se-Geun</creator><creator>Lee, El-Hang</creator><creator>O, Beom-Hoan</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20080501</creationdate><title>Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture</title><author>Sung, Jun-Ho ; Yang, Jeong-Su ; Kim, Bo-Soon ; Choi, Chul-Hyun ; Lee, Min-Woo ; Lee, Seung-Gol ; Park, Se-Geun ; Lee, El-Hang ; O, Beom-Hoan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c358t-c7245623f3a9c0352f2ad180a3f9158deedce02ca9ec84418bbc6babb19fa3b03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Applied sciences</topic><topic>Circuit properties</topic><topic>Electric, optical and optoelectronic circuits</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Integrated optics. Optical fibers and wave guides</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Near-field holographic lithography</topic><topic>Non-uniform duty ratio</topic><topic>Optical and optoelectronic circuits</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Waveguide grating</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sung, Jun-Ho</creatorcontrib><creatorcontrib>Yang, Jeong-Su</creatorcontrib><creatorcontrib>Kim, Bo-Soon</creatorcontrib><creatorcontrib>Choi, Chul-Hyun</creatorcontrib><creatorcontrib>Lee, Min-Woo</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><creatorcontrib>Lee, El-Hang</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sung, Jun-Ho</au><au>Yang, Jeong-Su</au><au>Kim, Bo-Soon</au><au>Choi, Chul-Hyun</au><au>Lee, Min-Woo</au><au>Lee, Seung-Gol</au><au>Park, Se-Geun</au><au>Lee, El-Hang</au><au>O, Beom-Hoan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture</atitle><jtitle>Microelectronic engineering</jtitle><date>2008-05-01</date><risdate>2008</risdate><volume>85</volume><issue>5-6</issue><spage>925</spage><epage>928</epage><pages>925-928</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2008.01.094</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0167-9317 |
| ispartof | Microelectronic engineering, 2008-05, Vol.85 (5-6), p.925-928 |
| issn | 0167-9317 1873-5568 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_33553889 |
| source | Elsevier ScienceDirect Journals |
| subjects | Applied sciences Circuit properties Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Integrated optics. Optical fibers and wave guides Microelectronic fabrication (materials and surfaces technology) Near-field holographic lithography Non-uniform duty ratio Optical and optoelectronic circuits Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Waveguide grating |
| title | Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T09%3A48%3A17IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Control%20of%20duty%20ratio%20in%20waveguide%20gratings%20using%20a%20near-field%20holographic%20lithography%20system%20with%20a%20variable%20aperture&rft.jtitle=Microelectronic%20engineering&rft.au=Sung,%20Jun-Ho&rft.date=2008-05-01&rft.volume=85&rft.issue=5-6&rft.spage=925&rft.epage=928&rft.pages=925-928&rft.issn=0167-9317&rft.eissn=1873-5568&rft.coden=MIENEF&rft_id=info:doi/10.1016/j.mee.2008.01.094&rft_dat=%3Cproquest_cross%3E33553889%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=33553889&rft_id=info:pmid/&rft_els_id=S0167931708000816&rfr_iscdi=true |