Grain size effect on structural, electrical and mechanical properties of NiTi thin films deposited by magnetron co-sputtering

In the present study NiTi films have been deposited on Si (100) substrates by dc magnetron co-sputtering in the temperature range from room temperature to 923 K. The crystallization, surface morphology and structural features were studied using X-ray diffraction (XRD), atomic force microscope (AFM),...

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Veröffentlicht in:Surface & coatings technology 2009-03, Vol.203 (12), p.1596-1603
Hauptverfasser: Kumar, Ashvani, Singh, Devendra, Kaur, Davinder
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Sprache:eng
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