Reactive deposition of TiNx layers in a DC-magnetron discharge

TiNx layers have been deposited in ‘balanced mode’ and ‘unbalanced mode’ of a reactive DC‐magnetron plasma (carrier gas argon, reactive gas nitrogen) under different conditions. Discharge power and reactive gas flow have been varied. The layers have been examined by X‐ray photoelectron spectroscopy (XPS), X‐ray reflectometry (XR), and spectroscopic ellipsometry (SE). The results of the layer analyses were combined with plasma investigations carried out by means of energy resolved mass spectrometry under the same conditions. By this method, it is possible to obtain a comprehensive view on the fundamentals of layer deposition, especially on the influence of the ions on the layer properties. Results show that the operation mode of the magnetron has a significant influence on the titanium deposition rate and the incorporation of nitrogen into the layers. The increased energy influx to the growing film in unbalanced mode results in a higher titanium deposition rate despite the lower number of sputtered particles. It also leads to an enhanced nitrogen insertion, since stoichiometric TiN could only be deposited in unbalanced mode. Copyright © 2008 John Wiley & Sons, Ltd.