Fabrication and optical properties of SnS thin films by SILAR method

Although the fabrication of tin disulfide thin films by SILAR method is quiet common, there is, however, no report is available on the growth of SnS thin film using above technique. In the present work, SnS films of 0.20 μm thickness were grown on glass and ITO substrates by SILAR method using SnSO...

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Veröffentlicht in:Applied surface science 2008-08, Vol.254 (20), p.6436-6440
Hauptverfasser: Ghosh, Biswajit, Das, Madhumita, Banerjee, Pushan, Das, Subrata
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container_issue 20
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container_title Applied surface science
container_volume 254
creator Ghosh, Biswajit
Das, Madhumita
Banerjee, Pushan
Das, Subrata
description Although the fabrication of tin disulfide thin films by SILAR method is quiet common, there is, however, no report is available on the growth of SnS thin film using above technique. In the present work, SnS films of 0.20 μm thickness were grown on glass and ITO substrates by SILAR method using SnSO 4 and Na 2S solution. The as-grown films were smooth and strongly adherent to the substrate. XRD confirmed the deposition of SnS thin films. Scanning electron micrograph revealed almost equal distribution of the particle size well covered on the surface of the substrate. EDAX showed that as-grown SnS films were slightly rich in tin component while UV–vis transmission spectra exhibited high absorption in the visible region. The intense and sharp emission peaks at 680 and 825 nm (near band edge emission) dominated the photoluminescence spectra.
doi_str_mv 10.1016/j.apsusc.2008.04.008
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subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Photoluminescence
Physics
SILAR
SnS
Thin film
title Fabrication and optical properties of SnS thin films by SILAR method
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