Titanium oxidation by pulsed oxygen plasma

The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of Optoelectronics and Advanced Materials 2008-03, Vol.10 (3), p.680-682
Hauptverfasser: Balbag, M Z, Pat, S, Cenik, I, Ekem, N, Akan, T, Baksan, B, Vladoiu, R, Musa, G
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 682
container_issue 3
container_start_page 680
container_title Journal of Optoelectronics and Advanced Materials
container_volume 10
creator Balbag, M Z
Pat, S
Cenik, I
Ekem, N
Akan, T
Baksan, B
Vladoiu, R
Musa, G
description The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3 mm) of commercially pure titanium were oxidated by means of the high voltage pulsed discharge. The discharge chamber was introduced an oven system which reaches the elevated temperature of 900 deg C. The oxidation of titanium sample was performed for various oven temperatures (300, 500 and 700 deg C) but fixed discharge parameters (interelectrode distance, discharge current and discharge pressure). The microstructure of the oxidated titanium samples was examined by optical metallographic techniques and Scanning Electron Microscopy (SEM). The thickness and the hardness of the samples were measured.
format Article
fullrecord <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_32723686</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>32723686</sourcerecordid><originalsourceid>FETCH-LOGICAL-p186t-e543ac90ec2f846dd75e601bada141e0f311384d533ccd2e07dca19a8102622f3</originalsourceid><addsrcrecordid>eNotzM2KwjAUQOEsFKao79CVC6GQm5umcSllRgeE2ThruSa3EumfpgV9ewVdHfgWZyIS0LnONBj9JRYxXqSUAAUiqESsDmGgNoxN2t2DpyF0bXp6pP1YR_Yve5y5TfuaYkNzMa3oxYtPZ-L_5_tQ7rL93_a33OyzHqwZMs41kltLdqqy2nhf5GwknMgTaGBZIQBa7XNE57xiWXhHsCYLUhmlKpyJ5fvb37rryHE4NiE6rmtquRvjEVWh0FiDT_-BPr4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>32723686</pqid></control><display><type>article</type><title>Titanium oxidation by pulsed oxygen plasma</title><source>Free Full-Text Journals in Chemistry</source><creator>Balbag, M Z ; Pat, S ; Cenik, I ; Ekem, N ; Akan, T ; Baksan, B ; Vladoiu, R ; Musa, G</creator><creatorcontrib>Balbag, M Z ; Pat, S ; Cenik, I ; Ekem, N ; Akan, T ; Baksan, B ; Vladoiu, R ; Musa, G</creatorcontrib><description>The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3 mm) of commercially pure titanium were oxidated by means of the high voltage pulsed discharge. The discharge chamber was introduced an oven system which reaches the elevated temperature of 900 deg C. The oxidation of titanium sample was performed for various oven temperatures (300, 500 and 700 deg C) but fixed discharge parameters (interelectrode distance, discharge current and discharge pressure). The microstructure of the oxidated titanium samples was examined by optical metallographic techniques and Scanning Electron Microscopy (SEM). The thickness and the hardness of the samples were measured.</description><identifier>ISSN: 1454-4164</identifier><language>eng</language><ispartof>Journal of Optoelectronics and Advanced Materials, 2008-03, Vol.10 (3), p.680-682</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784</link.rule.ids></links><search><creatorcontrib>Balbag, M Z</creatorcontrib><creatorcontrib>Pat, S</creatorcontrib><creatorcontrib>Cenik, I</creatorcontrib><creatorcontrib>Ekem, N</creatorcontrib><creatorcontrib>Akan, T</creatorcontrib><creatorcontrib>Baksan, B</creatorcontrib><creatorcontrib>Vladoiu, R</creatorcontrib><creatorcontrib>Musa, G</creatorcontrib><title>Titanium oxidation by pulsed oxygen plasma</title><title>Journal of Optoelectronics and Advanced Materials</title><description>The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3 mm) of commercially pure titanium were oxidated by means of the high voltage pulsed discharge. The discharge chamber was introduced an oven system which reaches the elevated temperature of 900 deg C. The oxidation of titanium sample was performed for various oven temperatures (300, 500 and 700 deg C) but fixed discharge parameters (interelectrode distance, discharge current and discharge pressure). The microstructure of the oxidated titanium samples was examined by optical metallographic techniques and Scanning Electron Microscopy (SEM). The thickness and the hardness of the samples were measured.</description><issn>1454-4164</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNotzM2KwjAUQOEsFKao79CVC6GQm5umcSllRgeE2ThruSa3EumfpgV9ewVdHfgWZyIS0LnONBj9JRYxXqSUAAUiqESsDmGgNoxN2t2DpyF0bXp6pP1YR_Yve5y5TfuaYkNzMa3oxYtPZ-L_5_tQ7rL93_a33OyzHqwZMs41kltLdqqy2nhf5GwknMgTaGBZIQBa7XNE57xiWXhHsCYLUhmlKpyJ5fvb37rryHE4NiE6rmtquRvjEVWh0FiDT_-BPr4</recordid><startdate>20080301</startdate><enddate>20080301</enddate><creator>Balbag, M Z</creator><creator>Pat, S</creator><creator>Cenik, I</creator><creator>Ekem, N</creator><creator>Akan, T</creator><creator>Baksan, B</creator><creator>Vladoiu, R</creator><creator>Musa, G</creator><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20080301</creationdate><title>Titanium oxidation by pulsed oxygen plasma</title><author>Balbag, M Z ; Pat, S ; Cenik, I ; Ekem, N ; Akan, T ; Baksan, B ; Vladoiu, R ; Musa, G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p186t-e543ac90ec2f846dd75e601bada141e0f311384d533ccd2e07dca19a8102622f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Balbag, M Z</creatorcontrib><creatorcontrib>Pat, S</creatorcontrib><creatorcontrib>Cenik, I</creatorcontrib><creatorcontrib>Ekem, N</creatorcontrib><creatorcontrib>Akan, T</creatorcontrib><creatorcontrib>Baksan, B</creatorcontrib><creatorcontrib>Vladoiu, R</creatorcontrib><creatorcontrib>Musa, G</creatorcontrib><collection>Electronics &amp; Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Optoelectronics and Advanced Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Balbag, M Z</au><au>Pat, S</au><au>Cenik, I</au><au>Ekem, N</au><au>Akan, T</au><au>Baksan, B</au><au>Vladoiu, R</au><au>Musa, G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Titanium oxidation by pulsed oxygen plasma</atitle><jtitle>Journal of Optoelectronics and Advanced Materials</jtitle><date>2008-03-01</date><risdate>2008</risdate><volume>10</volume><issue>3</issue><spage>680</spage><epage>682</epage><pages>680-682</pages><issn>1454-4164</issn><abstract>The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3 mm) of commercially pure titanium were oxidated by means of the high voltage pulsed discharge. The discharge chamber was introduced an oven system which reaches the elevated temperature of 900 deg C. The oxidation of titanium sample was performed for various oven temperatures (300, 500 and 700 deg C) but fixed discharge parameters (interelectrode distance, discharge current and discharge pressure). The microstructure of the oxidated titanium samples was examined by optical metallographic techniques and Scanning Electron Microscopy (SEM). The thickness and the hardness of the samples were measured.</abstract><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1454-4164
ispartof Journal of Optoelectronics and Advanced Materials, 2008-03, Vol.10 (3), p.680-682
issn 1454-4164
language eng
recordid cdi_proquest_miscellaneous_32723686
source Free Full-Text Journals in Chemistry
title Titanium oxidation by pulsed oxygen plasma
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T04%3A29%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Titanium%20oxidation%20by%20pulsed%20oxygen%20plasma&rft.jtitle=Journal%20of%20Optoelectronics%20and%20Advanced%20Materials&rft.au=Balbag,%20M%20Z&rft.date=2008-03-01&rft.volume=10&rft.issue=3&rft.spage=680&rft.epage=682&rft.pages=680-682&rft.issn=1454-4164&rft_id=info:doi/&rft_dat=%3Cproquest%3E32723686%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=32723686&rft_id=info:pmid/&rfr_iscdi=true