Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating

Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating

TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N...

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Veröffentlicht in:Transactions of Nonferrous Metals Society of China 2007-12, Vol.17 (Special 1), p.s827-s830
Hauptverfasser: Li, Ming-Sheng, Zhang, Shu-Juan, Lou, Jin, Liu, Ting-Zhi, Zhou, Ze-Hua, Yang, Gan-Lan, Hu, Chang-Yuan, Li, Wen-Ku
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container_end_page s830
container_issue Special 1
container_start_page s827
container_title Transactions of Nonferrous Metals Society of China
container_volume 17
creator Li, Ming-Sheng
Zhang, Shu-Juan
Lou, Jin
Liu, Ting-Zhi
Zhou, Ze-Hua
Yang, Gan-Lan
Hu, Chang-Yuan
Li, Wen-Ku
description TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N-doped TiO2 films are amorphous. The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 deg C for 2 h. The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.
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fullrecord <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_32363549</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>32363549</sourcerecordid><originalsourceid>FETCH-proquest_miscellaneous_323635493</originalsourceid><addsrcrecordid>eNqNi7sKwjAUQDMoWB__cCe3QtrEgLMPBEGX7iWmqUbS3NibDv17Ef0ApwOHcyYsKzgXuRKlmrE50ZNzKZUqMnbe24jkksMA2EJ8YEKjk_ZjcgYqdy1BhwYueYPRNl_ROt8R3EbQvYHPGL1OLtyXbNpqT3b144Ktj4dqd8pjj6_BUqo7R8Z6r4PFgWpRCiU2civ-Dt-siT6c</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>32363549</pqid></control><display><type>article</type><title>Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating</title><source>Elsevier ScienceDirect Journals</source><source>Alma/SFX Local Collection</source><creator>Li, Ming-Sheng ; Zhang, Shu-Juan ; Lou, Jin ; Liu, Ting-Zhi ; Zhou, Ze-Hua ; Yang, Gan-Lan ; Hu, Chang-Yuan ; Li, Wen-Ku</creator><creatorcontrib>Li, Ming-Sheng ; Zhang, Shu-Juan ; Lou, Jin ; Liu, Ting-Zhi ; Zhou, Ze-Hua ; Yang, Gan-Lan ; Hu, Chang-Yuan ; Li, Wen-Ku</creatorcontrib><description>TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N-doped TiO2 films are amorphous. The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 deg C for 2 h. The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.</description><identifier>ISSN: 1003-6326</identifier><language>eng</language><ispartof>Transactions of Nonferrous Metals Society of China, 2007-12, Vol.17 (Special 1), p.s827-s830</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780</link.rule.ids></links><search><creatorcontrib>Li, Ming-Sheng</creatorcontrib><creatorcontrib>Zhang, Shu-Juan</creatorcontrib><creatorcontrib>Lou, Jin</creatorcontrib><creatorcontrib>Liu, Ting-Zhi</creatorcontrib><creatorcontrib>Zhou, Ze-Hua</creatorcontrib><creatorcontrib>Yang, Gan-Lan</creatorcontrib><creatorcontrib>Hu, Chang-Yuan</creatorcontrib><creatorcontrib>Li, Wen-Ku</creatorcontrib><title>Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating</title><title>Transactions of Nonferrous Metals Society of China</title><description>TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N-doped TiO2 films are amorphous. The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 deg C for 2 h. The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.</description><issn>1003-6326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqNi7sKwjAUQDMoWB__cCe3QtrEgLMPBEGX7iWmqUbS3NibDv17Ef0ApwOHcyYsKzgXuRKlmrE50ZNzKZUqMnbe24jkksMA2EJ8YEKjk_ZjcgYqdy1BhwYueYPRNl_ROt8R3EbQvYHPGL1OLtyXbNpqT3b144Ktj4dqd8pjj6_BUqo7R8Z6r4PFgWpRCiU2civ-Dt-siT6c</recordid><startdate>20071201</startdate><enddate>20071201</enddate><creator>Li, Ming-Sheng</creator><creator>Zhang, Shu-Juan</creator><creator>Lou, Jin</creator><creator>Liu, Ting-Zhi</creator><creator>Zhou, Ze-Hua</creator><creator>Yang, Gan-Lan</creator><creator>Hu, Chang-Yuan</creator><creator>Li, Wen-Ku</creator><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20071201</creationdate><title>Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating</title><author>Li, Ming-Sheng ; Zhang, Shu-Juan ; Lou, Jin ; Liu, Ting-Zhi ; Zhou, Ze-Hua ; Yang, Gan-Lan ; Hu, Chang-Yuan ; Li, Wen-Ku</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_miscellaneous_323635493</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Ming-Sheng</creatorcontrib><creatorcontrib>Zhang, Shu-Juan</creatorcontrib><creatorcontrib>Lou, Jin</creatorcontrib><creatorcontrib>Liu, Ting-Zhi</creatorcontrib><creatorcontrib>Zhou, Ze-Hua</creatorcontrib><creatorcontrib>Yang, Gan-Lan</creatorcontrib><creatorcontrib>Hu, Chang-Yuan</creatorcontrib><creatorcontrib>Li, Wen-Ku</creatorcontrib><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Transactions of Nonferrous Metals Society of China</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Ming-Sheng</au><au>Zhang, Shu-Juan</au><au>Lou, Jin</au><au>Liu, Ting-Zhi</au><au>Zhou, Ze-Hua</au><au>Yang, Gan-Lan</au><au>Hu, Chang-Yuan</au><au>Li, Wen-Ku</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating</atitle><jtitle>Transactions of Nonferrous Metals Society of China</jtitle><date>2007-12-01</date><risdate>2007</risdate><volume>17</volume><issue>Special 1</issue><spage>s827</spage><epage>s830</epage><pages>s827-s830</pages><issn>1003-6326</issn><abstract>TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N-doped TiO2 films are amorphous. The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 deg C for 2 h. The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.</abstract></addata></record>
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title Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T21%3A52%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Deposition%20of%20photocatalytic%20TiO2%20and%20N-doped%20TiO2%20films%20by%20arc%20ion%20plating&rft.jtitle=Transactions%20of%20Nonferrous%20Metals%20Society%20of%20China&rft.au=Li,%20Ming-Sheng&rft.date=2007-12-01&rft.volume=17&rft.issue=Special%201&rft.spage=s827&rft.epage=s830&rft.pages=s827-s830&rft.issn=1003-6326&rft_id=info:doi/&rft_dat=%3Cproquest%3E32363549%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=32363549&rft_id=info:pmid/&rfr_iscdi=true