Exploring the role of film thickness and oxygen vacancies on the H2S gas-sensing performance of RF magnetron-sputtered NiO thin films

This work explores the thickness effect of RF magnetron-sputtered nickel oxide (NiO) thin films for evaluating their H 2 S gas-sensing characteristics. NiO thin films were prepared on alumina substrates by varying the deposition time, and the resulting film thicknesses were 25 nm, 52 nm, and 76 nm....

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Veröffentlicht in:Journal of materials science 2024-10, Vol.59 (37), p.17322-17337
Hauptverfasser: Srivastava, Stuti, Dwivedi, Charu, Kumar, Ashwani, Gupta, Govind, Singh, Preetam
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Sprache:eng
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