Plasma-enhanced chemical vapor deposition of nanocrystalline diamond
Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on...
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| Veröffentlicht in: | Science and technology of advanced materials 2007-10, Vol.8 (7), p.624-634 |
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| creator | Okada, Katsuyuki |
| description | Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700
nm diameter have been prepared in a 13.56
MHz low-pressure inductively coupled CH
4/CO/H
2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp
2-bonded carbons around the 20–50
nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH
4/H
2 plasma. |
| doi_str_mv | 10.1016/j.stam.2007.08.008 |
| format | Article |
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nm diameter have been prepared in a 13.56
MHz low-pressure inductively coupled CH
4/CO/H
2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp
2-bonded carbons around the 20–50
nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH
4/H
2 plasma.</description><identifier>ISSN: 1468-6996</identifier><identifier>EISSN: 1878-5514</identifier><identifier>DOI: 10.1016/j.stam.2007.08.008</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><subject>Atomic beam spectroscopy ; Carbon ; Channels ; chemical mapping ; Chemical vapor deposition ; Direct simulation Monte Carlo ; Electron energy distribution ; Electron energy distribution function ; Electron energy loss spectroscopy ; High-resolution electron energy loss spectroscopy ; Langmuir probe ; Low-pressure inductively coupled plasma ; Nanocrystalline diamond ; Nanocrystals ; Plasma diagnostics ; Resonance Raman scattering ; sp ; sp 2/sp 3 chemical mapping ; Threshold voltage ; UV Raman spectroscopy</subject><ispartof>Science and technology of advanced materials, 2007-10, Vol.8 (7), p.624-634</ispartof><rights>2007 NIMS and Elsevier Ltd</rights><rights>2007 Elsevier Science Ltd 2007</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c601t-5d0b79a7dea6ee1e4f45e23f76e173b60d80b05d56359194ca90039055b779a83</citedby><cites>FETCH-LOGICAL-c601t-5d0b79a7dea6ee1e4f45e23f76e173b60d80b05d56359194ca90039055b779a83</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1016/j.stam.2007.08.008/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,864,1553,27628,27924,27925,53904,53931</link.rule.ids><linktorsrc>$$Uhttp://iopscience.iop.org/1468-6996/8/7-8/A12$$EView_record_in_IOP_Publishing$$FView_record_in_$$GIOP_Publishing</linktorsrc></links><search><creatorcontrib>Okada, Katsuyuki</creatorcontrib><title>Plasma-enhanced chemical vapor deposition of nanocrystalline diamond</title><title>Science and technology of advanced materials</title><description>Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700
nm diameter have been prepared in a 13.56
MHz low-pressure inductively coupled CH
4/CO/H
2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp
2-bonded carbons around the 20–50
nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH
4/H
2 plasma.</description><subject>Atomic beam spectroscopy</subject><subject>Carbon</subject><subject>Channels</subject><subject>chemical mapping</subject><subject>Chemical vapor deposition</subject><subject>Direct simulation Monte Carlo</subject><subject>Electron energy distribution</subject><subject>Electron energy distribution function</subject><subject>Electron energy loss spectroscopy</subject><subject>High-resolution electron energy loss spectroscopy</subject><subject>Langmuir probe</subject><subject>Low-pressure inductively coupled plasma</subject><subject>Nanocrystalline diamond</subject><subject>Nanocrystals</subject><subject>Plasma diagnostics</subject><subject>Resonance Raman scattering</subject><subject>sp</subject><subject>sp 2/sp 3 chemical mapping</subject><subject>Threshold voltage</subject><subject>UV Raman spectroscopy</subject><issn>1468-6996</issn><issn>1878-5514</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNp9kU1L5TAUhsvgwKgzf2BWXYkMtHPSNl_gLETnCwRd6DrkJqeYS5rUpCr335tyhdkMdxGSxfOeQ563qr4SaAkQ9n3b5kVPbQfAWxAtgPhQHRPBRUMpGY7Ke2CiYVKyT9VJzlsAYKQbjqvrO6_zpBsMjzoYtLV5xMkZ7esXPcdUW5xjdouLoY5jHXSIJu3KLu9dwNo6PcVgP1cfR-0zfnm_T6uHXz_vr_40N7e__15d3jSGAVkaamHDpeYWNUMkOIwDxa4fOUPC-w0DK2AD1FLWU0nkYLQE6CVQuuElJ_rT6mw_d07x6RnzoiaXDXqvA8bnrHoy9AwoL-D5QZCA6IgsrCxot0dNijknHNWc3KTTrkBqdau2anWrVrcKhCpuS-jbPuTi_I8vitWqWAnFy7kknZrtWODmP_Ch4T_e-TDGNOnXmLxVi975mMZUWnLrTw_lL_Z5LFW8OEwqG4druS6hWZSN7tD6N5lHsv8</recordid><startdate>20071001</startdate><enddate>20071001</enddate><creator>Okada, Katsuyuki</creator><general>Elsevier Ltd</general><general>Taylor & Francis</general><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20071001</creationdate><title>Plasma-enhanced chemical vapor deposition of nanocrystalline diamond</title><author>Okada, Katsuyuki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c601t-5d0b79a7dea6ee1e4f45e23f76e173b60d80b05d56359194ca90039055b779a83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Atomic beam spectroscopy</topic><topic>Carbon</topic><topic>Channels</topic><topic>chemical mapping</topic><topic>Chemical vapor deposition</topic><topic>Direct simulation Monte Carlo</topic><topic>Electron energy distribution</topic><topic>Electron energy distribution function</topic><topic>Electron energy loss spectroscopy</topic><topic>High-resolution electron energy loss spectroscopy</topic><topic>Langmuir probe</topic><topic>Low-pressure inductively coupled plasma</topic><topic>Nanocrystalline diamond</topic><topic>Nanocrystals</topic><topic>Plasma diagnostics</topic><topic>Resonance Raman scattering</topic><topic>sp</topic><topic>sp 2/sp 3 chemical mapping</topic><topic>Threshold voltage</topic><topic>UV Raman spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Okada, Katsuyuki</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Science and technology of advanced materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Okada, Katsuyuki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Plasma-enhanced chemical vapor deposition of nanocrystalline diamond</atitle><jtitle>Science and technology of advanced materials</jtitle><date>2007-10-01</date><risdate>2007</risdate><volume>8</volume><issue>7</issue><spage>624</spage><epage>634</epage><pages>624-634</pages><issn>1468-6996</issn><eissn>1878-5514</eissn><abstract>Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200–700
nm diameter have been prepared in a 13.56
MHz low-pressure inductively coupled CH
4/CO/H
2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp
2-bonded carbons around the 20–50
nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH
4/H
2 plasma.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/j.stam.2007.08.008</doi><tpages>11</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Science and technology of advanced materials, 2007-10, Vol.8 (7), p.624-634 |
| issn | 1468-6996 1878-5514 |
| language | eng |
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| source | Institute of Physics Open Access Journal Titles |
| subjects | Atomic beam spectroscopy Carbon Channels chemical mapping Chemical vapor deposition Direct simulation Monte Carlo Electron energy distribution Electron energy distribution function Electron energy loss spectroscopy High-resolution electron energy loss spectroscopy Langmuir probe Low-pressure inductively coupled plasma Nanocrystalline diamond Nanocrystals Plasma diagnostics Resonance Raman scattering sp sp 2/sp 3 chemical mapping Threshold voltage UV Raman spectroscopy |
| title | Plasma-enhanced chemical vapor deposition of nanocrystalline diamond |
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