Design and manufacture of a 2K transistor p-well CMOS gate array in a student run factory at RIT
A 2000 transistor p-well CMOS gate array has been designed for use as a teaching tool in the microelectronic engineering program at RIT. Students in microelectronic engineering study integrated circuit design and integrated circuit manufacturing starting in the first year of the five year program. T...
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creator | Fuller, L.F. Kraaijenvanger, C. |
description | A 2000 transistor p-well CMOS gate array has been designed for use as a teaching tool in the microelectronic engineering program at RIT. Students in microelectronic engineering study integrated circuit design and integrated circuit manufacturing starting in the first year of the five year program. The gate array is manufactured up to level 8 of the 11 level process by students in 5th year manufacturing classes. Levels 8 through 11 include contact cut, metal-one, via and metal-two. These levels are where the gate array is customized. The first year students design simple digital circuits, learn about schematic capture, simulation, bread boarding and layout. They also complete the wafer fabrication as part of their laboratory experience. Students in more advanced courses design more complex analog and digital circuits to be realized using the 2000 transistor gate array. The gate array project has provided an interesting educational experience in design, layout and manufacturing for students from freshmen year to graduate level. The devices function, turn around time is about one week for the last 4 levels of the process. |
doi_str_mv | 10.1109/GLSV.1995.516059 |
format | Conference Proceeding |
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The devices function, turn around time is about one week for the last 4 levels of the process.</description><subject>Circuit simulation</subject><subject>Design engineering</subject><subject>Digital circuits</subject><subject>Education</subject><subject>Fabrication</subject><subject>Integrated circuit manufacture</subject><subject>Integrated circuit synthesis</subject><subject>Laboratories</subject><subject>Manufacturing processes</subject><subject>Microelectronics</subject><issn>1066-1395</issn><isbn>0818670355</isbn><isbn>9780818670350</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1995</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotkDFPwzAUhC0BEm1hR0xvYkvxi2PHHlGhpaKoEi2swXVeqqA2KbYj1H9PULnllrtPp2PsBvkYkZv72WL1MUZj5Fii4tKcsSHXqFXOhZTnbIBcqQSFkZdsGMIX5ymXQgzY5yOFetuAbUrY26arrIudJ2grsJC-QPS2CXWIrYdD8kO7HUxelyvY2khgvbdHqPsyhNiV1ETwXQN_iNYfwUZ4m6-v2EVld4Gu_33E3qdP68lzsljO5pOHRVKjkDFxeZmrTZXyErM8JyO0Q52SRudMagWvBCnbS8hMKp7nWkldVpRtJDpelUKM2N2Je_Dtd0chFvs6uH6wbajtQiEQM2l01gdvT8GaiIqDr_fWH4vTa-IXdE9f2Q</recordid><startdate>1995</startdate><enddate>1995</enddate><creator>Fuller, L.F.</creator><creator>Kraaijenvanger, C.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope><scope>7SC</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope></search><sort><creationdate>1995</creationdate><title>Design and manufacture of a 2K transistor p-well CMOS gate array in a student run factory at RIT</title><author>Fuller, L.F. ; Kraaijenvanger, C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i135t-c7d76bf20d1477e938c182e81cc92a30f3e6aaaa354560778658dfe4b51c0fd33</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Circuit simulation</topic><topic>Design engineering</topic><topic>Digital circuits</topic><topic>Education</topic><topic>Fabrication</topic><topic>Integrated circuit manufacture</topic><topic>Integrated circuit synthesis</topic><topic>Laboratories</topic><topic>Manufacturing processes</topic><topic>Microelectronics</topic><toplevel>online_resources</toplevel><creatorcontrib>Fuller, L.F.</creatorcontrib><creatorcontrib>Kraaijenvanger, C.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection><collection>Computer and Information Systems Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Fuller, L.F.</au><au>Kraaijenvanger, C.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Design and manufacture of a 2K transistor p-well CMOS gate array in a student run factory at RIT</atitle><btitle>Great Lakes 5th Symposium on VSLI</btitle><stitle>GLSV</stitle><date>1995</date><risdate>1995</risdate><spage>238</spage><epage>241</epage><pages>238-241</pages><issn>1066-1395</issn><isbn>0818670355</isbn><isbn>9780818670350</isbn><abstract>A 2000 transistor p-well CMOS gate array has been designed for use as a teaching tool in the microelectronic engineering program at RIT. Students in microelectronic engineering study integrated circuit design and integrated circuit manufacturing starting in the first year of the five year program. The gate array is manufactured up to level 8 of the 11 level process by students in 5th year manufacturing classes. Levels 8 through 11 include contact cut, metal-one, via and metal-two. These levels are where the gate array is customized. The first year students design simple digital circuits, learn about schematic capture, simulation, bread boarding and layout. They also complete the wafer fabrication as part of their laboratory experience. Students in more advanced courses design more complex analog and digital circuits to be realized using the 2000 transistor gate array. The gate array project has provided an interesting educational experience in design, layout and manufacturing for students from freshmen year to graduate level. The devices function, turn around time is about one week for the last 4 levels of the process.</abstract><pub>IEEE</pub><doi>10.1109/GLSV.1995.516059</doi><tpages>4</tpages></addata></record> |
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identifier | ISSN: 1066-1395 |
ispartof | Great Lakes 5th Symposium on VSLI, 1995, p.238-241 |
issn | 1066-1395 |
language | eng |
recordid | cdi_proquest_miscellaneous_31145984 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Circuit simulation Design engineering Digital circuits Education Fabrication Integrated circuit manufacture Integrated circuit synthesis Laboratories Manufacturing processes Microelectronics |
title | Design and manufacture of a 2K transistor p-well CMOS gate array in a student run factory at RIT |
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