Atom probe tomography today
This review aims to describe and illustrate the advances in the application of atom probe tomography that have been made possible by recent developments, particularly in specimen preparation techniques (using dual-beam focused-ion beam instruments) but also of the more routine use of laser pulsing....
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| Veröffentlicht in: | Materials today (Kidlington, England) England), 2007-12, Vol.10 (12), p.36-42 |
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| container_title | Materials today (Kidlington, England) |
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| creator | Cerezo, Alfred Clifton, Peter H. Galtrey, Mark J. Humphreys, Colin J. Kelly, Thomas F. Larson, David J. Lozano-Perez, Sergio Marquis, Emmanuelle A. Oliver, Rachel A. Sha, Gang Thompson, Keith Zandbergen, Mathijs Alvis, Roger L. |
| description | This review aims to describe and illustrate the advances in the application of atom probe tomography that have been made possible by recent developments, particularly in specimen preparation techniques (using dual-beam focused-ion beam instruments) but also of the more routine use of laser pulsing. The combination of these two developments now permits atomic-scale investigation of site-specific regions within engineering alloys (e.g. at grain boundaries and in the vicinity of cracks) and also the atomic-level characterization of interfaces in multilayers, oxide films, and semiconductor materials and devices. |
| doi_str_mv | 10.1016/S1369-7021(07)70306-1 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 1369-7021 |
| ispartof | Materials today (Kidlington, England), 2007-12, Vol.10 (12), p.36-42 |
| issn | 1369-7021 1873-4103 |
| language | eng |
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| source | ScienceDirect College Edition; Access via ScienceDirect (Elsevier); EZB Electronic Journals Library |
| subjects | Alloys Beams (radiation) Grain boundaries Lasers Multilayers Oxide coatings Semiconductor materials Tomography |
| title | Atom probe tomography today |
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