Nanoscale observations of the operational failure for phase-change-type nonvolatile memory devices using Ge2Sb2Te5 chalcogenide thin films

In this study, a phase-change memory device was fabricated and the origin of device failure mode was examined using transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). Ge2Sb2Te5 (GST) was used as the active phase-change material in the memory device and the active...

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Veröffentlicht in:Applied surface science 2007-10, Vol.254 (1), p.316-320
Hauptverfasser: YOON, Sung-Min, CHOI, Kyu-Jeong, LEE, Nam-Yeal, LEE, Seung-Yun, PARK, Young-Sam, YU, Byoung-Gon
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Sprache:eng
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