Microdisk and Microring Lasers of Thiophene-Phenylene Co-Oligomers Embedded in Si/SiO2 Substrates
Lasing emission with whispering gallery modes is achieved for microcavities of thiophene–phenylene co‐oligomers embedded in Si/SiO2 substrates. The microcavities show a lasing threshold that is 20–50 % of the values observed for bulk films. Quality factors of a few thousand are achieved for these st...
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Veröffentlicht in: | Advanced materials (Weinheim) 2007-11, Vol.19 (21), p.3653-3655 |
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creator | Sasaki, F. Kobayashi, S. Haraichi, S. Fujiwara, S. Bando, K. Masumoto, Y. Hotta, S. |
description | Lasing emission with whispering gallery modes is achieved for microcavities of thiophene–phenylene co‐oligomers embedded in Si/SiO2 substrates. The microcavities show a lasing threshold that is 20–50 % of the values observed for bulk films. Quality factors of a few thousand are achieved for these structures. The grain boundaries and cracks in the film at the circumferential interface are thought to limit the quality factor and lasing threshold of these microcavities. |
doi_str_mv | 10.1002/adma.200701008 |
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The microcavities show a lasing threshold that is 20–50 % of the values observed for bulk films. Quality factors of a few thousand are achieved for these structures. The grain boundaries and cracks in the film at the circumferential interface are thought to limit the quality factor and lasing threshold of these microcavities.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.200701008</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Lasing ; Light-emitting materials ; Microcavities ; organic ; Semiconductors ; Semiconductors, organic</subject><ispartof>Advanced materials (Weinheim), 2007-11, Vol.19 (21), p.3653-3655</ispartof><rights>Copyright © 2007 WILEY‐VCH Verlag GmbH & Co. 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Mater</addtitle><description>Lasing emission with whispering gallery modes is achieved for microcavities of thiophene–phenylene co‐oligomers embedded in Si/SiO2 substrates. The microcavities show a lasing threshold that is 20–50 % of the values observed for bulk films. Quality factors of a few thousand are achieved for these structures. The grain boundaries and cracks in the film at the circumferential interface are thought to limit the quality factor and lasing threshold of these microcavities.</description><subject>Lasing</subject><subject>Light-emitting materials</subject><subject>Microcavities</subject><subject>organic</subject><subject>Semiconductors</subject><subject>Semiconductors, organic</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNo9kM1PAjEQxRujiYhePffkrTLddtvtERHBBMRkMRyb7m4XKvuBW4jy37srhsvMe8l7k8wPoXsKjxQgGJisNI8BgITWRheoR8OAEg4qvEQ9UCwkSvDoGt14_wkASoDoITN3aVNnzm-xqTL85xpXrfHMeNt4XOd4uXH1bmMrS97beSxahUc1WRRuXZddZlwmNstshl2FYzeI3SLA8SHx-8bsrb9FV7kpvL3733308TJejqZktpi8joYz4lgEEWE55LkRRoHkgWE5FYrJAFgeyjDhPOWWpUKmEaM0UTKgIQjRPsWyRIW8U330cLq7a-qvg_V7XTqf2qIwla0PXrMWBOcg26A6Bb9dYY9617jSNEdNQXcYdYdRnzHq4fN8eHZtl5y6zu_tz7lrmq0WkslQr94mOmBPqzmlUx2zX5XUdkM</recordid><startdate>20071105</startdate><enddate>20071105</enddate><creator>Sasaki, F.</creator><creator>Kobayashi, S.</creator><creator>Haraichi, S.</creator><creator>Fujiwara, S.</creator><creator>Bando, K.</creator><creator>Masumoto, Y.</creator><creator>Hotta, S.</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20071105</creationdate><title>Microdisk and Microring Lasers of Thiophene-Phenylene Co-Oligomers Embedded in Si/SiO2 Substrates</title><author>Sasaki, F. ; Kobayashi, S. ; Haraichi, S. ; Fujiwara, S. ; Bando, K. ; Masumoto, Y. ; Hotta, S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i3808-3f0ffa6a90742a3f16937203f575b44c4e3c67c8311b972150660933db9546093</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Lasing</topic><topic>Light-emitting materials</topic><topic>Microcavities</topic><topic>organic</topic><topic>Semiconductors</topic><topic>Semiconductors, organic</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sasaki, F.</creatorcontrib><creatorcontrib>Kobayashi, S.</creatorcontrib><creatorcontrib>Haraichi, S.</creatorcontrib><creatorcontrib>Fujiwara, S.</creatorcontrib><creatorcontrib>Bando, K.</creatorcontrib><creatorcontrib>Masumoto, Y.</creatorcontrib><creatorcontrib>Hotta, S.</creatorcontrib><collection>Istex</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sasaki, F.</au><au>Kobayashi, S.</au><au>Haraichi, S.</au><au>Fujiwara, S.</au><au>Bando, K.</au><au>Masumoto, Y.</au><au>Hotta, S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Microdisk and Microring Lasers of Thiophene-Phenylene Co-Oligomers Embedded in Si/SiO2 Substrates</atitle><jtitle>Advanced materials (Weinheim)</jtitle><addtitle>Adv. Mater</addtitle><date>2007-11-05</date><risdate>2007</risdate><volume>19</volume><issue>21</issue><spage>3653</spage><epage>3655</epage><pages>3653-3655</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>Lasing emission with whispering gallery modes is achieved for microcavities of thiophene–phenylene co‐oligomers embedded in Si/SiO2 substrates. The microcavities show a lasing threshold that is 20–50 % of the values observed for bulk films. Quality factors of a few thousand are achieved for these structures. The grain boundaries and cracks in the film at the circumferential interface are thought to limit the quality factor and lasing threshold of these microcavities.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/adma.200701008</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Lasing Light-emitting materials Microcavities organic Semiconductors Semiconductors, organic |
title | Microdisk and Microring Lasers of Thiophene-Phenylene Co-Oligomers Embedded in Si/SiO2 Substrates |
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