Single Atom Ag Bonding Between PF3T Nanocluster and TiO2 Leads the Ultra‐Stable Visible‐Light‐Driven Photocatalytic H2 Production
Atomic Ag cluster bonding is employed to reinforce the interface between PF3T nano‐cluster and TiO2 nanoparticle. With an optimized Ag loading (Ag/TiO2 = 0.5 wt%), the Ag atoms will uniformly disperse on TiO2 thus generating a high density of intermediate states in the band gap to form the electron...
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Veröffentlicht in: | Small (Weinheim an der Bergstrasse, Germany) Germany), 2024-10, Vol.20 (43), p.e2403176-n/a |
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Sprache: | eng |
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Zusammenfassung: | Atomic Ag cluster bonding is employed to reinforce the interface between PF3T nano‐cluster and TiO2 nanoparticle. With an optimized Ag loading (Ag/TiO2 = 0.5 wt%), the Ag atoms will uniformly disperse on TiO2 thus generating a high density of intermediate states in the band gap to form the electron channel between the terthiophene group of PF3T and the TiO2 in the hybrid composite (denoted as T@Ag05‐P). The former expands the photon absorption band width and the latter facilitates the core‐hole splitting by injecting the photon excited electron (from the excitons in PF3T) into the conduction band (CB) of TiO2. These characteristics enable the high efficiency of H2 production to 16 580 µmol h−1 g−1 and photocatalysis stability without degradation under visible light exposure for 96 h. Compared to that of hybrid material without Ag bonding (TiO2@PF3T), the H2 production yield and stability are improved by 4.1 and 18.2‐fold which shows the best performance among existing materials in similar component combination and interfacial reinforcement. The unique bonding method offers a new prospect to accelerate the development of photocatalytic hydrogen production technologies.
The Ag single‐atomic layer forms a strong bond with the PF3T molecule. It triggers the electron injection from PF3T to the conduction band of TiO2 consequently boosting the H2 production of the nanocomposite by photocatalytic water splitting. |
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ISSN: | 1613-6810 1613-6829 1613-6829 |
DOI: | 10.1002/smll.202403176 |