Photodissociation effects on the electron density and on FTIR measurements in a BTMSM/Ar discharge
For precise measurements of the absolute electron density in a bis-trimethylsilymethane (BTMSM) and argon plasma, the authors adapted a wave cutoff method and used the plasma frequency. The films were deposited on a p-type Si(1 0 0) substrate by means of UV-assisted inductively coupled plasma-enhanc...
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| Veröffentlicht in: | Journal of physics. D, Applied physics Applied physics, 2007-07, Vol.40 (14), p.4164-4167 |
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| container_end_page | 4167 |
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| container_issue | 14 |
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| container_title | Journal of physics. D, Applied physics |
| container_volume | 40 |
| creator | Bong Jung, Won Jun Jang, Yong Kyu Choi, Chi Young Chang, Hong |
| description | For precise measurements of the absolute electron density in a bis-trimethylsilymethane (BTMSM) and argon plasma, the authors adapted a wave cutoff method and used the plasma frequency. The films were deposited on a p-type Si(1 0 0) substrate by means of UV-assisted inductively coupled plasma-enhanced chemical vapour deposition. Fourier transform infrared spectroscopy was used to investigate the bonding configuration of the SiCH films. With UV illumination, the electron density was found to increase in the low power region and decrease in the high power region. The peak intensity of Si-CH3 decreases with UV illumination under all conditions. Moreover, when the UV source illuminates the plasma, the peak intensity of CH2 increases whereas the peak intensity of CH3 decreases. |
| doi_str_mv | 10.1088/0022-3727/40/14/010 |
| format | Article |
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The films were deposited on a p-type Si(1 0 0) substrate by means of UV-assisted inductively coupled plasma-enhanced chemical vapour deposition. Fourier transform infrared spectroscopy was used to investigate the bonding configuration of the SiCH films. With UV illumination, the electron density was found to increase in the low power region and decrease in the high power region. The peak intensity of Si-CH3 decreases with UV illumination under all conditions. 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| issn | 0022-3727 1361-6463 |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Discharges for spectral sources (including inductively coupled plasmas) Electric discharges Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition |
| title | Photodissociation effects on the electron density and on FTIR measurements in a BTMSM/Ar discharge |
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