A ferromagnetic resonance study of NiFe alloy thin films

NiFe alloy films with thicknesses in the range from 60 to 150 Å were sputtered onto Si (0 0 1) wafers by DC magnetron sputtering, and then characterized by in-plane ferromagnetic resonance technique (FMR) at x-band. The FMR field ( H R) and linewidth (Δ H) were studied as a function of the in-plane...

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Veröffentlicht in:Journal of magnetism and magnetic materials 2007-09, Vol.316 (2), p.e462-e465
Hauptverfasser: Díaz de Sihues, M., Durante-Rincón, C.A., Fermin, J.R.
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Sprache:eng
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