Surface composition, bonding, and morphology in the nucleation and growth of ultra-thin, high quality nanocrystalline diamond films
The morphology, composition, and bonding character (carbon hybridization state) of continuous, ultra-thin (thickness ∼ 60 nm) nanocrystalline diamond (NCD) membranes are reported. NCD films were deposited on a silicon substrate that was pretreated using an optimized, two-step seeding process. The su...
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| Veröffentlicht in: | Diamond and related materials 2007-04, Vol.16 (4), p.718-724 |
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| creator | Sumant, Anirudha V. Gilbert, P.U.P.A. Grierson, David S. Konicek, Andrew R. Abrecht, Mike Butler, James E. Feygelson, Tatyana Rotter, Shlomo S. Carpick, Robert W. |
| description | The morphology, composition, and bonding character (carbon hybridization state) of continuous, ultra-thin (thickness ∼
60 nm) nanocrystalline diamond (NCD) membranes are reported. NCD films were deposited on a silicon substrate that was pretreated using an optimized, two-step seeding process. The surface after each of the two steps, the as-grown NCD topside and the NCD underside (revealed by etching away the silicon substrate) is examined by X-ray PhotoElectron Emission spectroMicroscopy (X-PEEM) combined with X-ray absorption near edge structure (XANES) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The first step in the seeding process, a short exposure to a hydrocarbon plasma, induces the formation of SiC at the diamond/Si interface along with a thin, uniform layer of hydrogenated, amorphous carbon on top. This amorphous carbon layer allows for a uniform, dense layer of nanodiamond seed particles to be spread over the substrate in the second step. This facilitates the growth of a homogeneous, continuous, smooth, and highly sp
3-bonded NCD film. We show for the first time that the underside of this film possesses atomic-scale smoothness (RMS roughness: 0.3 nm) and >
98% diamond content, demonstrating the effectiveness of the two-step seeding method for diamond film nucleation. |
| doi_str_mv | 10.1016/j.diamond.2006.12.011 |
| format | Article |
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60 nm) nanocrystalline diamond (NCD) membranes are reported. NCD films were deposited on a silicon substrate that was pretreated using an optimized, two-step seeding process. The surface after each of the two steps, the as-grown NCD topside and the NCD underside (revealed by etching away the silicon substrate) is examined by X-ray PhotoElectron Emission spectroMicroscopy (X-PEEM) combined with X-ray absorption near edge structure (XANES) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The first step in the seeding process, a short exposure to a hydrocarbon plasma, induces the formation of SiC at the diamond/Si interface along with a thin, uniform layer of hydrogenated, amorphous carbon on top. This amorphous carbon layer allows for a uniform, dense layer of nanodiamond seed particles to be spread over the substrate in the second step. This facilitates the growth of a homogeneous, continuous, smooth, and highly sp
3-bonded NCD film. We show for the first time that the underside of this film possesses atomic-scale smoothness (RMS roughness: 0.3 nm) and >
98% diamond content, demonstrating the effectiveness of the two-step seeding method for diamond film nucleation.</description><identifier>ISSN: 0925-9635</identifier><identifier>EISSN: 1879-0062</identifier><identifier>DOI: 10.1016/j.diamond.2006.12.011</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>AFM ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Fullerenes and related materials; diamonds, graphite ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanocrystalline diamond ; Nucleation ; Physics ; Specific materials ; Theory and models of film growth ; XANES</subject><ispartof>Diamond and related materials, 2007-04, Vol.16 (4), p.718-724</ispartof><rights>2007 Elsevier B.V.</rights><rights>2007 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c436t-d3fe766a03685cb0e262741b639ada4c52eedf57426ff6c967d2766b09fdc4f43</citedby><cites>FETCH-LOGICAL-c436t-d3fe766a03685cb0e262741b639ada4c52eedf57426ff6c967d2766b09fdc4f43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.diamond.2006.12.011$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3548,23928,23929,25138,27922,27923,45993</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18759837$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Sumant, Anirudha V.</creatorcontrib><creatorcontrib>Gilbert, P.U.P.A.</creatorcontrib><creatorcontrib>Grierson, David S.</creatorcontrib><creatorcontrib>Konicek, Andrew R.</creatorcontrib><creatorcontrib>Abrecht, Mike</creatorcontrib><creatorcontrib>Butler, James E.</creatorcontrib><creatorcontrib>Feygelson, Tatyana</creatorcontrib><creatorcontrib>Rotter, Shlomo S.</creatorcontrib><creatorcontrib>Carpick, Robert W.</creatorcontrib><title>Surface composition, bonding, and morphology in the nucleation and growth of ultra-thin, high quality nanocrystalline diamond films</title><title>Diamond and related materials</title><description>The morphology, composition, and bonding character (carbon hybridization state) of continuous, ultra-thin (thickness ∼
60 nm) nanocrystalline diamond (NCD) membranes are reported. NCD films were deposited on a silicon substrate that was pretreated using an optimized, two-step seeding process. The surface after each of the two steps, the as-grown NCD topside and the NCD underside (revealed by etching away the silicon substrate) is examined by X-ray PhotoElectron Emission spectroMicroscopy (X-PEEM) combined with X-ray absorption near edge structure (XANES) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The first step in the seeding process, a short exposure to a hydrocarbon plasma, induces the formation of SiC at the diamond/Si interface along with a thin, uniform layer of hydrogenated, amorphous carbon on top. This amorphous carbon layer allows for a uniform, dense layer of nanodiamond seed particles to be spread over the substrate in the second step. This facilitates the growth of a homogeneous, continuous, smooth, and highly sp
3-bonded NCD film. We show for the first time that the underside of this film possesses atomic-scale smoothness (RMS roughness: 0.3 nm) and >
98% diamond content, demonstrating the effectiveness of the two-step seeding method for diamond film nucleation.</description><subject>AFM</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Fullerenes and related materials; diamonds, graphite</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanocrystalline diamond</subject><subject>Nucleation</subject><subject>Physics</subject><subject>Specific materials</subject><subject>Theory and models of film growth</subject><subject>XANES</subject><issn>0925-9635</issn><issn>1879-0062</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqFkE-LFDEQxYO44LjrRxBy0dN2m6S7052TyLL-gQUPq-eQSSrTGdLJbJJW5rxf3Iwz4NFTQfF7r-o9hN5S0lJC-Yd9a5xaYjAtI4S3lLWE0hdoQ6dRNHXDXqINEWxoBO-GV-h1zntCKBM93aDnxzVZpQHruBxidsXFcIu31cyF3S1WweAlpsMcfdwdsQu4zIDDqj2oE_oX2KX4u8w4Wrz6klRTZlc9Zreb8dOqvCtHHFSIOh1zUd67APjyMLbOL_kGXVnlM7y5zGv08_P9j7uvzcP3L9_uPj00uu94aUxnYeRckY5Pg94SYJyNPd3yTiijej0wAGOHsWfcWq4FHw2r_JYIa3Rv--4avT_7HlJ8WiEXubiswXsVIK5ZMiEGPlFRweEM6hRzTmDlIblFpaOkRJ4ql3t5SSBPlUvKZK286t5dDqislbdJBe3yP_E0DmLqxsp9PHNQ0_5ykGTWDoIG4xLoIk10_7n0B1elnPU</recordid><startdate>20070401</startdate><enddate>20070401</enddate><creator>Sumant, Anirudha V.</creator><creator>Gilbert, P.U.P.A.</creator><creator>Grierson, David S.</creator><creator>Konicek, Andrew R.</creator><creator>Abrecht, Mike</creator><creator>Butler, James E.</creator><creator>Feygelson, Tatyana</creator><creator>Rotter, Shlomo S.</creator><creator>Carpick, Robert W.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20070401</creationdate><title>Surface composition, bonding, and morphology in the nucleation and growth of ultra-thin, high quality nanocrystalline diamond films</title><author>Sumant, Anirudha V. ; Gilbert, P.U.P.A. ; Grierson, David S. ; Konicek, Andrew R. ; Abrecht, Mike ; Butler, James E. ; Feygelson, Tatyana ; Rotter, Shlomo S. ; Carpick, Robert W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c436t-d3fe766a03685cb0e262741b639ada4c52eedf57426ff6c967d2766b09fdc4f43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>AFM</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Fullerenes and related materials; diamonds, graphite</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Nanocrystalline diamond</topic><topic>Nucleation</topic><topic>Physics</topic><topic>Specific materials</topic><topic>Theory and models of film growth</topic><topic>XANES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sumant, Anirudha V.</creatorcontrib><creatorcontrib>Gilbert, P.U.P.A.</creatorcontrib><creatorcontrib>Grierson, David S.</creatorcontrib><creatorcontrib>Konicek, Andrew R.</creatorcontrib><creatorcontrib>Abrecht, Mike</creatorcontrib><creatorcontrib>Butler, James E.</creatorcontrib><creatorcontrib>Feygelson, Tatyana</creatorcontrib><creatorcontrib>Rotter, Shlomo S.</creatorcontrib><creatorcontrib>Carpick, Robert W.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Diamond and related materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sumant, Anirudha V.</au><au>Gilbert, P.U.P.A.</au><au>Grierson, David S.</au><au>Konicek, Andrew R.</au><au>Abrecht, Mike</au><au>Butler, James E.</au><au>Feygelson, Tatyana</au><au>Rotter, Shlomo S.</au><au>Carpick, Robert W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface composition, bonding, and morphology in the nucleation and growth of ultra-thin, high quality nanocrystalline diamond films</atitle><jtitle>Diamond and related materials</jtitle><date>2007-04-01</date><risdate>2007</risdate><volume>16</volume><issue>4</issue><spage>718</spage><epage>724</epage><pages>718-724</pages><issn>0925-9635</issn><eissn>1879-0062</eissn><abstract>The morphology, composition, and bonding character (carbon hybridization state) of continuous, ultra-thin (thickness ∼
60 nm) nanocrystalline diamond (NCD) membranes are reported. NCD films were deposited on a silicon substrate that was pretreated using an optimized, two-step seeding process. The surface after each of the two steps, the as-grown NCD topside and the NCD underside (revealed by etching away the silicon substrate) is examined by X-ray PhotoElectron Emission spectroMicroscopy (X-PEEM) combined with X-ray absorption near edge structure (XANES) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The first step in the seeding process, a short exposure to a hydrocarbon plasma, induces the formation of SiC at the diamond/Si interface along with a thin, uniform layer of hydrogenated, amorphous carbon on top. This amorphous carbon layer allows for a uniform, dense layer of nanodiamond seed particles to be spread over the substrate in the second step. This facilitates the growth of a homogeneous, continuous, smooth, and highly sp
3-bonded NCD film. We show for the first time that the underside of this film possesses atomic-scale smoothness (RMS roughness: 0.3 nm) and >
98% diamond content, demonstrating the effectiveness of the two-step seeding method for diamond film nucleation.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.diamond.2006.12.011</doi><tpages>7</tpages></addata></record> |
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| subjects | AFM Cross-disciplinary physics: materials science rheology Exact sciences and technology Fullerenes and related materials diamonds, graphite Materials science Methods of deposition of films and coatings film growth and epitaxy Nanocrystalline diamond Nucleation Physics Specific materials Theory and models of film growth XANES |
| title | Surface composition, bonding, and morphology in the nucleation and growth of ultra-thin, high quality nanocrystalline diamond films |
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