Plasma pretreatment on Si(1 1 1) substrates for the growth of ZnO thin films

ZnO films have been grown on Si(1 1 1) substrates by metal-organic chemical vapor deposition. The Si substrates were pretreated by the Ar + plasma bombardment before the ZnO growth for the purpose of eliminating the remnant amorphous silica layers from the substrates’ surface. The effects of the pla...

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Veröffentlicht in:	Journal of crystal growth 2007-05, Vol.303 (2), p.655-658
Hauptverfasser:	Zhu, Junjie, Yao, Ran, Zhong, Sheng, Fu, Zhuxi, Lee, In-Hwan
Format:	Artikel
Sprache:	eng
Schlagworte:	A1. Surface processes A3. Metal-organic vapor phase deposition B1. ZnO films Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Photoluminescence Physics Theory and models of film growth
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