Fabrication of near-infrared and optical meta-materials on insulating substrates by lift-off using PMMA/Al stack

Fabrication of near-infrared and optical meta-materials on insulating substrates by lift-off using PMMA/Al stack

A novel lift-off process using PMMA/Al bi-layer stack is presented. The aluminium sacrificial layer underneath PMMA layer functions as a conducting layer so that e-beam exposure can be performed on an insulating substrate. Furthermore, it helps to create an undercut profile in an alkaline solution w...

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Veröffentlicht in:Microelectronic engineering 2007-05, Vol.84 (5), p.1144-1147
Hauptverfasser: Xia, Xiaoxiang, Yang, Haifang, Wang, Zongli, Li, Yunlong, Cui, Zheng, Chen, Yifang, Gu, Changzhi
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Electron beam lithography
Lift-off
Meta-materials
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container_end_page 1147
container_issue 5
container_start_page 1144
container_title Microelectronic engineering
container_volume 84
creator Xia, Xiaoxiang
Yang, Haifang
Wang, Zongli
Li, Yunlong
Cui, Zheng
Chen, Yifang
Gu, Changzhi
description A novel lift-off process using PMMA/Al bi-layer stack is presented. The aluminium sacrificial layer underneath PMMA layer functions as a conducting layer so that e-beam exposure can be performed on an insulating substrate. Furthermore, it helps to create an undercut profile in an alkaline solution with appropriate conditions. The dissolution rates of aluminium layer were measured. Other conditions for controlling the undercut profile were investigated. A meta-material consisting of silver U-shape array with minimum feature dimension of 40 nm for near-infrared and optical wavelength has been successfully fabricated on a quartz substrate using the novel process.
doi_str_mv 10.1016/j.mee.2007.01.149
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subjects Electron beam lithography
Lift-off
Meta-materials
title Fabrication of near-infrared and optical meta-materials on insulating substrates by lift-off using PMMA/Al stack
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