Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS)

The aim of the research was to determine the dependence of the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) on the substrate to chamber wall distance. A Hiden Electrostatic Quadrupole Plasma Analyser (EQP) has been used to invest...

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Veröffentlicht in:Surface & coatings technology 2007-05, Vol.201 (16), p.6960-6969
Hauptverfasser: Lin, J., Mishra, B., Moore, J.J., Sproul, W.D., Rees, J.A.
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container_end_page 6969
container_issue 16
container_start_page 6960
container_title Surface & coatings technology
container_volume 201
creator Lin, J.
Mishra, B.
Moore, J.J.
Sproul, W.D.
Rees, J.A.
description The aim of the research was to determine the dependence of the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) on the substrate to chamber wall distance. A Hiden Electrostatic Quadrupole Plasma Analyser (EQP) has been used to investigate the positive ion energy distributions (IED) in the plasma. It was found that increasing the substrate to chamber wall distance from 127 mm to 203 mm can significantly increase the ion flux in front of the substrate. The improvement of the ion flux in front of the substrate region facilitates ion bombardment on the substrate, increases the mobility of the adatoms on the substrate surface, thereby resulting in a denser film with reduced grain size, which exhibited high hardness (∼ 30 GPa) and good wear resistance (0.35 COF, and a wear rate of 3.36 × 10 − 6  mm 3 N − 1 m − 1 ) at the substrate to chamber wall distance of 203 mm. The CrAlN film deposited at a relatively short substrate to chamber wall distance with the rotation system has comparable structure and properties with those films deposited at large substrate to chamber wall distance at fixed substrate positions.
doi_str_mv 10.1016/j.surfcoat.2006.12.026
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source Elsevier ScienceDirect Journals Complete
subjects Applied sciences
Chromium aluminum nitride (CrAlN)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Ion energy distributions (IED)
Ion flux
Materials science
Metals. Metallurgy
Other topics in materials science
Physics
Production techniques
Pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS)
Substrate to chamber wall distance
Surface treatment
title Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS)
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