850nm wavelength range nanoscale resonant optical filter fabrication using standard microelectronics techniques
The fabrication and characterization of a nanoscale resonant optical filter at wavelength around 850nm is reported using standard C-MOS compatible microelectronics techniques. We discuss the different steps of the process and their impact on the final structure. We show that the use of these techniq...
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| Veröffentlicht in: | Microelectronic engineering 2007-04, Vol.84 (4), p.673-677 |
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| container_end_page | 677 |
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| container_issue | 4 |
| container_start_page | 673 |
| container_title | Microelectronic engineering |
| container_volume | 84 |
| creator | Hernandez, S. Bouchard, O. Scheid, E. Daran, E. Jalabert, L. Arguel, P. Bonnefont, S. Gauthier-Lafaye, O. Lozes-Dupuy, F. |
| description | The fabrication and characterization of a nanoscale resonant optical filter at wavelength around 850nm is reported using standard C-MOS compatible microelectronics techniques. We discuss the different steps of the process and their impact on the final structure. We show that the use of these techniques gives an efficient filter on glass substrate with high transmission and a narrow bandwidth of 0.4nm. We also demonstrate the same process on a silicon substrate for a potential integration with electronic functions. |
| doi_str_mv | 10.1016/j.mee.2007.01.006 |
| format | Article |
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| source | Elsevier ScienceDirect Journals Complete |
| title | 850nm wavelength range nanoscale resonant optical filter fabrication using standard microelectronics techniques |
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