Thin film stress measurement by fiber optic strain gage
In this work, we present a new optical Fiber Bragg Grating (FBG) strain sensor which can be utilized to measure in situ the induced substrate strain caused by the film stress. The fiber optical sensor is interfaced to an analyzer to determine the wavelength shift of the reflected signal due to strai...
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| Veröffentlicht in: | Thin solid films 2006-01, Vol.494 (1), p.141-145 |
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| container_title | Thin solid films |
| container_volume | 494 |
| creator | Quintero, S.M.M. Quirino, W.G. Triques, A.L.C. Valente, L.C.G. Braga, A.M.B. Achete, C.A. Cremona, M. |
| description | In this work, we present a new optical Fiber Bragg Grating (FBG) strain sensor which can be utilized to measure in situ the induced substrate strain caused by the film stress. The fiber optical sensor is interfaced to an analyzer to determine the wavelength shift of the reflected signal due to strain and temperature effects. The technique was used during the deposition of silicon dioxide and silicon carbide (SiC) thin films by RF magnetron sputtering, onto thin (38 μm) stainless steel substrates. The direct measurement of the wavelength shift Δ
λ provides the strain value
ε which can be used to find the residual stress
σ present in the film/substrate interface. The preliminary results for SiC are in agreement with other works reported in the literature. The uncertainty provided by the measuring system is about 1 μm/m. Research is under way to improve the accuracy and study the possibility to develop a more compact device. |
| doi_str_mv | 10.1016/j.tsf.2005.08.215 |
| format | Article |
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λ provides the strain value
ε which can be used to find the residual stress
σ present in the film/substrate interface. The preliminary results for SiC are in agreement with other works reported in the literature. The uncertainty provided by the measuring system is about 1 μm/m. Research is under way to improve the accuracy and study the possibility to develop a more compact device.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2005.08.215</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Elasticity, elastic constants ; Exact sciences and technology ; Fiber bragg grating ; Materials science ; Mechanical and acoustical properties of condensed matter ; Mechanical properties of solids ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Residual stress ; Strain gage</subject><ispartof>Thin solid films, 2006-01, Vol.494 (1), p.141-145</ispartof><rights>2005 Elsevier B.V.</rights><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c389t-5f22c954fc59107d07bcca79600463c3ce4858a1eb24a44cc515983fcbf939ae3</citedby><cites>FETCH-LOGICAL-c389t-5f22c954fc59107d07bcca79600463c3ce4858a1eb24a44cc515983fcbf939ae3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.tsf.2005.08.215$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3550,23930,23931,25140,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17535384$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Quintero, S.M.M.</creatorcontrib><creatorcontrib>Quirino, W.G.</creatorcontrib><creatorcontrib>Triques, A.L.C.</creatorcontrib><creatorcontrib>Valente, L.C.G.</creatorcontrib><creatorcontrib>Braga, A.M.B.</creatorcontrib><creatorcontrib>Achete, C.A.</creatorcontrib><creatorcontrib>Cremona, M.</creatorcontrib><title>Thin film stress measurement by fiber optic strain gage</title><title>Thin solid films</title><description>In this work, we present a new optical Fiber Bragg Grating (FBG) strain sensor which can be utilized to measure in situ the induced substrate strain caused by the film stress. The fiber optical sensor is interfaced to an analyzer to determine the wavelength shift of the reflected signal due to strain and temperature effects. The technique was used during the deposition of silicon dioxide and silicon carbide (SiC) thin films by RF magnetron sputtering, onto thin (38 μm) stainless steel substrates. The direct measurement of the wavelength shift Δ
λ provides the strain value
ε which can be used to find the residual stress
σ present in the film/substrate interface. The preliminary results for SiC are in agreement with other works reported in the literature. The uncertainty provided by the measuring system is about 1 μm/m. Research is under way to improve the accuracy and study the possibility to develop a more compact device.</description><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Elasticity, elastic constants</subject><subject>Exact sciences and technology</subject><subject>Fiber bragg grating</subject><subject>Materials science</subject><subject>Mechanical and acoustical properties of condensed matter</subject><subject>Mechanical properties of solids</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Residual stress</subject><subject>Strain gage</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNqFkD1rHDEQhoWJwRfHP8DdNkm369HXSiJVMLEdOHDj1EI7N7J17MdF2gv432eXO0iXVFPM874zPIzdcmg48PZu38wlNgJAN2AbwfUF23BrXC2M5B_YBkBB3YKDK_axlD0AcCHkhpmXtzRWMfVDVeZMpVQDhXLMNNA4V937suooV9NhTrgSYaFfwyt9Ypcx9IVuzvOa_Xz4_nL_VG-fH3_cf9vWKK2bax2FQKdVRO04mB2YDjEY1y7_tBIlkrLaBk6dUEEpRM21szJiF510geQ1-3LqPeTp15HK7IdUkPo-jDQdixfOCGOV-j9oW2uUtAvITyDmqZRM0R9yGkJ-9xz86tLv_eLSry49WL-4XDKfz-WhYOhjDiOm8jdotNTSrk98PXG0KPmdKPuCiUakXcqEs99N6R9X_gDvOIhl</recordid><startdate>20060103</startdate><enddate>20060103</enddate><creator>Quintero, S.M.M.</creator><creator>Quirino, W.G.</creator><creator>Triques, A.L.C.</creator><creator>Valente, L.C.G.</creator><creator>Braga, A.M.B.</creator><creator>Achete, C.A.</creator><creator>Cremona, M.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope><scope>7TB</scope><scope>FR3</scope></search><sort><creationdate>20060103</creationdate><title>Thin film stress measurement by fiber optic strain gage</title><author>Quintero, S.M.M. ; 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λ provides the strain value
ε which can be used to find the residual stress
σ present in the film/substrate interface. The preliminary results for SiC are in agreement with other works reported in the literature. The uncertainty provided by the measuring system is about 1 μm/m. Research is under way to improve the accuracy and study the possibility to develop a more compact device.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2005.08.215</doi><tpages>5</tpages></addata></record> |
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| subjects | Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Elasticity, elastic constants Exact sciences and technology Fiber bragg grating Materials science Mechanical and acoustical properties of condensed matter Mechanical properties of solids Methods of deposition of films and coatings film growth and epitaxy Physics Residual stress Strain gage |
| title | Thin film stress measurement by fiber optic strain gage |
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