Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition

Titanium dioxide (TiO2) thin films were prepared using Titanium [bis(dipiraloymethanate) diisopropoxide] (Ti(dpm)2(OPri)2) and Titanium isopropoxide (Ti(OPri)4) complex compound precursors by Chemical Vapour Deposition (CVD) and photo-assisted CVD. Structural information on TiO2 thin films was obtai...

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Veröffentlicht in:Thin solid films 2006-05, Vol.503 (1-2), p.29-39
Hauptverfasser: Bessergenev, V.G., Pereira, R.J.F., Mateus, M.C., Khmelinskii, I.V., Vasconcelos, D.A., Nicula, R., Burkel, E., Botelho do Rego, A.M., Saprykin, A.I.
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Sprache:eng
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